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Academic Journal
te Vrugt, M.; Bartels, A.; Kosch, L.; Feldmeyer, L.; Hollfoth, V.; Tölle, I.; Randau, G.; Michgehl, U.; Hotfilder, M.; Lanvers-Kaminsky, C.; Burkhardt, B.
In Leukemia Research October 2022 121 Supplement:S47-S48
Academic Journal
Tölle, I.; Lanvers-Kaminsky, C.; Bethke, M.; Randau, G.; Rolfing, M.; Tann, A.; te Vrugt, M.; Mellgren, K.; Müller, S.; Burkhardt, B.
In Leukemia Research October 2022 121 Supplement:S23-S24
Academic Journal
Huibers, M.; Beishuizen, A.; Abla, O.; Andrés, M.; Verdú-Amorós, J.; Balagué, O.; Pillon, M.; Carraro, E.; Chiang, A.; Csóka, M.; David, B.-A.; Goyet, M.D.V.D.; Gilad, G.; Hori, D.; Kotecha, R.S.; Kabickova, E.; Klapper, W.; Miakova, N.; Minard-Colin, V.; Rigaud, C.; Nakazawa, A.; Salaverria, I.; Tölle, I.; Burkhardt, B.; von Mersi, H.; Attarbaschi, A.; Wössmann, W.
In: Blood Advances . (Blood Advances, 26 March 2024, 8(6):1509-1514)
Academic Journal
In: EMBO Reports . (EMBO Reports, 5 April 2023, 24(4))
Academic Journal
In: International Journal of Advanced Manufacturing Technology , Advances in nanomanufacturing (pp. 513-600). (International Journal of Advanced Manufacturing Technology, January 2013, 64(1-4):555-577)
Academic Journal
In: Computers and Chemical Engineering . (Computers and Chemical Engineering, 15 November 2011, 35(11):2564-2578)
Academic Journal
In: History and Technology . (History and Technology, September 2011, 27(3):331-352)
Academic Journal
In: Industrial and Engineering Chemistry Research . (Industrial and Engineering Chemistry Research, 1 July 2009, 48(13):6137-6144)
Conference
Lee, S.; Jain, A.; Plihal, M.; Paramasivam, S.; Ng, T.-K.; Soltanmohammadi, E.; Tolle, I.; Salvador, D.
In: ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings , 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2019. (ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings, May 2019, 2019-May)
Conference
In: Proceedings of SPIE - The International Society for Optical Engineering , Metrology, Inspection, and Process Control for Microlithography XXXIII. (Proceedings of SPIE - The International Society for Optical Engineering, 2019, 10959)
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[AR] Tölle, I.
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