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Hoedlmoser, H.; Greiter, M.; Bandalo, V.; Brönner, J.; Kleinau, P.; Haninger, T.; Mende, E.; Emmerl, M.; Scheubert, P.; Esser, R.; Figel, M.
In Radiation Measurements March 2020 132
Academic Journal
Bandalo, V.; Figel, M.; Greiter, M.B.; Brönner, J.; Kleinau, P.; Haninger, T.; Strobel, I.; Mende, E.; Scheubert, P.; Eßer, R.; Furlan, M.; Schmid, M.; Hoedlmoser, H.
In Radiation Measurements February 2020 131
Academic Journal
Hoedlmoser, H.; Greiter, M.; Bandalo, V.; Brönner, J.; Kleinau, P.; Haninger, T.; Emmerl, M.; Mende, E.; Scheubert, P.; Esser, R.; Figel, M.
In Radiation Measurements February 2020 131
Academic Journal
Hoedlmoser, H.; Greiter, M.; Bandalo, V.; Mende, E.; Brönner, J.; Kleinau, P.; Haninger, T.; Furlan, M.; Schmid, M.; Esser, R.; Scheubert, P.; Figel, M.
In Radiation Measurements June 2019 125:106-115
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In Surface & Coatings Technology 2003 174:482-486
Academic Journal
In Surface & Coatings Technology 2003 174:570-573
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In Surface & Coatings Technology 2001 142:342-347
Academic Journal
In Surface & Coatings Technology 2001 142:526-530
Conference
1999 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD'99 (IEEE Cat. No.99TH8387) Simulation of semiconductor processes and devices Simulation of Semiconductor Processes and Devices, 1999. SISPAD '99. 1999 International Conference on. :191-194 1999
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[AR] Scheubert, P.
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