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In Colloids and Surfaces A: Physicochemical and Engineering Aspects 2001 183:27-40
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Pelaz, B; Alexiou, CH; Alvarez -Puebla, RA; Alves, F; Andrews, AM; Ashraf, S; Balogh, LP; Ballerini, L; Bestetti, A; Brendel, C; Bosi, S; Carril, M; Chan, WCW; Chen, CY; Chen, XD; Chen, XY; Cheng, Z; Cui, DX; Du, JZ; Dullin, C; Escudero, A; Feliu, N; Gao, MY; George, M; Gogotsi, Y; Grunweller, A; Gu, ZW; Halas, NJ; Hampp, N; Hartmann, RK; Hersam, MC; Hunziker, P; Jian, J; Jiang, XY; Jungebluth, P; Kadhiresan, P; Kataoka, K; Khademhosseini, A; Kopecek, J; Kotov, NA; Krug, HF; Lee, DS; Lehr, CM; Leong, KW; Liang, XJ; Lim, ML; Liz-Marzan, LM; Ma, XM; Macchiarini, P; Meng, H; Mohwald, H; Mulvaney, P; Nel, AE; Nie, SM; Nordlander, P; Okano, T; Oliveira, J; Park, TH; Penner, RM; Prato, M; Puntes, V; Rotello, VM; Samarakoon, A; Schaak, RE; Shen, YQ; Sjoqvist, S; Skirtach, AG; Soliman, MG; Stevens, MM; Sung, HW; Tang, BZ; Tietze, R; Udugama, BN; VanEpps, JS; Weil, T; Weiss, PS; Willner, I; Wu, YZ; Yang, LL; Yue, Z; Zhang, Q; Zhang, XE; Zhao, YL; Zhou, X; Parak, WJ
ACS nano. 11(3):2313-2381
Academic Journal
In Colloids and Surfaces A: Physicochemical and Engineering Aspects 2000 171(1):25-31
Academic Journal
In Journal of Colloid And Interface Science 15 August 1999 216(2):297-302
Academic Journal
In Materials Science & Engineering C 1999 8:3-11
Academic Journal
In Colloids and Surfaces A: Physicochemical and Engineering Aspects 1999 152(3):357-365
Academic Journal
Annual Review of Physical Chemistry; Oct1990, Vol. 41 Issue 1, p441-476, 36p
Academic Journal
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[AR] Möhwald, H
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