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Ferguson, R.; Ausschnitt, C.; Chang, I.; Farrell, T.; Hashimoto, K.; Liebmann, L.; Martino, R.; Maurer, W.; Mii, T.; Moy, D.; Neisser, M.; Nunes, R.; Samuels, D.; Weed, J.
Proceedings of 1994 VLSI Technology Symposium VLSI technology VLSI Technology, 1994. Digest of Technical Papers. 1994 Symposium on. :89-90 1994
Conference
Brunner, T.A.; Kissoon, N.N.; Truffert, V.; Ausschnitt, C.; van Look, L.; Franke, J.-H.; Duriau, E.; Jonckers, T.
In: Proceedings of SPIE - The International Society for Optical Engineering , International Conference on Extreme Ultraviolet Lithography 2022. (Proceedings of SPIE - The International Society for Optical Engineering, 2022, 12292)
Academic Journal
IEEE Journal of Quantum Electronics IEEE J. Quantum Electron. Quantum Electronics, IEEE Journal of. 13(5):321-333 May, 1977
Academic Journal
IEEE Journal of Quantum Electronics IEEE J. Quantum Electron. Quantum Electronics, IEEE Journal of. 15(9):912-917 Sep, 1979
Conference
Wiltshire, T.; Ausschnitt, C.; Felix, N.; Hwang, E.; Pike, M.; Gabor, A.; Preil, M.; Couraudon, V.; Schreiber, J.; Fliervoet, T.; Simons, G.; Rottenkolber, E.
Advanced Semiconductor Manufacturing Conference (ASMC), 2011 22nd Annual IEEE/SEMI; 2011, p1-6, 6p
Conference
Wiltshire, T.; Corliss, D.; Brunner, T.; Ausschnitt, C.; Young, R.; Nielson, R.; Hwang, E.; Iannucci Jr., J.
Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72720W-72720W-12, 12p
Conference
In: Proceedings of SPIE - The International Society for Optical Engineering , International Conference on Extreme Ultraviolet Lithography 2019. (Proceedings of SPIE - The International Society for Optical Engineering, 2019, 11147)
Academic Journal
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1993, Vol. 11 Issue 6, p2645-2650, 6p
Conference
In: Proceedings of SPIE - The International Society for Optical Engineering , Metrology, Inspection, and Process Control for Microlithography XXVI. (Proceedings of SPIE - The International Society for Optical Engineering, 2012, 8324)
Conference
In: Proceedings of SPIE - The International Society for Optical Engineering , Optical Microlithography XXIII. (Proceedings of SPIE - The International Society for Optical Engineering, 2010, 7640)
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[AR] Ausschnitt, C.
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