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Growth dynamics of hydrogenated silicon nanoparticles under realistic conditions of a plasma reactor

Document Type

Journal

Author

Vach, H; Brulin, Q; Chaabane, N; Novikova, T; Cabarrocas, PRI; Kalache, B; Hassouni, K; Botti, S; Reining, L

Source

COMPUTATIONAL MATERIALS SCIENCE; MAR 2006, 35 3, p216-p222, 7p.

Subject

Language

English

ISSN

18790801

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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