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Change in depth profile of N highly incorporated into SiO2 by plasma-assisted nitridation
Document Type
Journal
Author
Cho, MH
;
Chung, KB
;
Kim, YK
;
Kim, DC
;
Heo, JH
;
Koo, BY
;
Shin, YK
;
Chung, UI
;
Moon, JT
;
Ko, DH
Source
ELECTROCHEMICAL AND SOLID STATE LETTERS
; 2006, 9 5, pF27-pF30, 4p.
Subject
Language
English
ISSN
10990062
Online Access
Web of Science
Scopus
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