e-Article
Measuring energy-dependent photoelectron escape in microcrystals
Document Type
Academic Journal
Author
Source
International Union of Crystallography Journal. January, 2020, Vol. 7 Issue 1, p129, 7 p.
Subject
Language
English
ISSN
2052-2525
Abstract
With the increasing trend of using microcrystals and intense microbeams at synchrotron X-ray beamlines, radiation damage becomes a more pressing problem. Theoretical calculations show that the photoelectrons that primarily cause damage can escape microcrystals. This effect would become more pronounced with decreasing crystal size as well as at higher energies. To prove this effect, data from cryocooled lysozyme crystals of dimensions 5 x 3 x 3and 20 x 8 x 8 [micro]m mounted on cryo-transmission electron microscopy (cryo-TEM) grids were collected at 13.5 and 20.1 keV using a PILATUS CdTe 2M detector, which has a similar quantum efficiency at both energies. Accurate absorbed doses were calculated through the direct measurement of individual crystal sizes using scanning electron microscopy after the experiment and characterization of the X-ray microbeam. The crystal lifetime was then quantified based on the [D.sub.1/2] metric. In this first systematic study, a longer crystal lifetime for smaller crystals was observed and crystal lifetime increased at higher X-ray energies, supporting the theoretical predictions of photoelectron escape. The use of detector technologies specifically optimized for data collection at energies above 20 keV allows the theoretically predicted photoelectron escape to be quantified and exploited, guiding future beamline-design choices. Keywords: photoelectron escape; CdTe detector; cryo-TEM sample mounts; microcrystals.
1. Introduction With the advances in X-ray focusing techniques and increasing brilliance of the late third and the new fourth generations of synchrotrons, highly intense microbeams have become widely available [...]
1. Introduction With the advances in X-ray focusing techniques and increasing brilliance of the late third and the new fourth generations of synchrotrons, highly intense microbeams have become widely available [...]