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e-Article

Heavily Doped Channel Carrier Mobility in β-Ga2O3 Lateral Accumulation MOSFET
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 71(5):3429-3432 May, 2024
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Scattering
MOSFET
Logic gates
Voltage measurement
Magnetic field measurement
Temperature measurement
Doping
μ-Ga₂O₃
channel mobility
Hall measurement
power metal-oxide-semiconductor field-effect-transistors (MOSFET)
specific ON-resistance
Language
ISSN
0018-9383
1557-9646
Abstract
High critical field ( ${E}_{c}$ ) and low specific ON-resistance ( ${R}_{ON}$ ) $\beta $ -Ga2O3 devices such as accumulation channel metal-oxide-semiconductor field-effect-transistors (MOSFET) have been reported for high-power and extreme environment applications. Channel carrier mobility is a critical factor to reduce ${R}_{ON}$ , but a lack of studies on channel mobility in $\beta $ -Ga2O3 MOSFETs hinders understanding the electrical characteristics. We study carrier mobility in the channels with various doping concentrations using MOS-gated Hall measurements. Our MOSFET achieves a record-high peak channel mobility ( $\mu _{peak}$ ) of 143 cm2/ $\text{V}\cdot \text{s}$ , to the best of our knowledge. Moreover, we suggest that further improvements can be made by enhancing Coulomb scattering-limited mobility ( $\mu _{C}$ ).