Catalog
| LDR | 00762namka2200217 k 4500 | ||
| 001 | 0000428431▲ | ||
| 005 | 20180520122652▲ | ||
| 007 | ta▲ | ||
| 008 | 981218s1997 jjka m WC 000 kor ▲ | ||
| 012 | ▼a KDM199832274▲ | ||
| 040 | ▼a 011001▼c 011001 ▼d 221016▲ | ||
| 041 | 0 | ▼a kor▼b eng▲ | |
| 082 | 0 | ▼a 530.4175▼2 21▲ | |
| 090 | ▼a 530.4175▼b 오14ㅇ▲ | ||
| 100 | 1 | ▼a 오경숙▲ | |
| 245 | 1 | 0 | ▼a O₂/FTES-Helicon plasma CVD 방법에 의한 Fluorocarbonated-SiOF 박막형성과 그 특성/=▼x Formation and characteristics of the fluorocarbonated SiOF film by O₂/FTES-Helicon plasma CVD Method/▼d 吳景淑▲ |
| 260 | ▼a 제주:▼b 濟州大學校,▼c 1997.▲ | ||
| 300 | ▼a 61장:▼b 삽도;▼c 26cm.▲ | ||
| 502 | 0 | ▼a 학위논문(석사)--▼b 제주대학교 대학원:▼c 물리학과,▼d 1997▲ | |
| 653 | ▼a O₂▼a FTESHELICON▼a PLASMA▼a CVD▼a FLUOROCARBONATED▼a SIOF▼a 박막▲ | ||
| 999 | ▼a 신주영▼b 신주영▲ |
O₂/FTES-Helicon plasma CVD 방법에 의한 Fluorocarbonated-SiOF 박막형성과 그 특성/= Formation and characteristics of the fluorocarbonated SiOF film by O₂/FTES-Helicon plasma CVD Method
Document Type
Thesis
Title
O₂/FTES-Helicon plasma CVD 방법에 의한 Fluorocarbonated-SiOF 박막형성과 그 특성/ = Formation and characteristics of the fluorocarbonated SiOF film by O₂/FTES-Helicon plasma CVD Method / 吳景淑
개인저자
Publication
제주 : 濟州大學校 , 1997.
Physical Description
61장 : 삽도 ; 26cm.
Dissertation Note
학위논문(석사)-- 제주대학교 대학원 : 물리학과 , 1997
Keyword
Call Number
530.4175 오14ㅇ
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