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발행년	- (예 : 2010-2015)

전체선택

Convergence towards large perimeter overlay Run-to-Run using multivariate APC system

Conference

Duclaux, B.; Pelletier, A.; De-Caunes, J.; Perrier, R.; Babaud, L.; Gatefait, M.; Fagart, O.; Thivolle, N.; Guerabsi, M.; Chapon, J.-D.; Perrin, B.; Monget, C.

In: ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings, 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2019. (ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings, May 2019, 2019-May)

Full Text (IEEE) Scopus Find it@PNU

Study of aging behaviour on 193nm Phase Shift Masks

Conference

Dufaye, F.; Thivolle, N.; Lecarpentier, L.; Sundermann, F.; Pogliani, C.; Galbiati, A.; Crawford, C.; Hutchinson, T.

In: Proceedings of SPIE - The International Society for Optical Engineering, Optical Microlithography XXX. (Proceedings of SPIE - The International Society for Optical Engineering, 2017, 10147)

Scopus Find it@PNU

Binary 193nm photomasks aging phenomenon study

Conference

Dufaye, F.; Gough, S.; Sundermann, F.; Charras, N.; Brochard, C.; Thivolle, N.; Sartelli, L.; Pogliani, C.; Miyashita, H.; Hidenori, Y.

In: Proceedings of SPIE - The International Society for Optical Engineering, Photomask and Next-Generation Lithography Mask Technology XVIII. (Proceedings of SPIE - The International Society for Optical Engineering, 2011, 8081)

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Improved CD control for 45-40nm CMOS logic patterning: Anticipation for 32-28nm

Conference

Le Gratiet, B.; Sundermann, F.; Massin, J.; Decaux, M.; Thivolle, N.; Baron, F.; Ostrovsky, A.; Monget, C.; Chapon, J.D.; Blancquaert, Y.; Dabertrand, K.; Thevenon, L.; Bry, B.; Cluet, N.; Borot, B.; Bingert, R.; Devoivre, T.; Gourard, P.; Babaud, L.; Buttgereit, U.; Birkner, R.; Joyner, M.; Graitzer, E.; Cohen, A.

In: Proceedings of SPIE - The International Society for Optical Engineering, Metrology, Inspection, and Process Control for Microlithography XXIV. (Proceedings of SPIE - The International Society for Optical Engineering, 2010, 7638)

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Intrafield process control for 45 nm CMOS logic patterning

Conference

Le Gratiet, B.; Massin, J.; Ostrovski, A.; Monget, C.; Decaux, M.; Thivolle, N.; Faure, R.; Baron, F.; Chapon, J.-D.; Dabertrand, K.; Sunderman, F.; Gouraud, P.; Babaud, L.; Thevenon, L.; Cluet, N.; Vandewalle, B.

In: Proceedings of SPIE - The International Society for Optical Engineering, Metrology, Inspection, and Process Control for Microlithography XXIII. (Proceedings of SPIE - The International Society for Optical Engineering, 2009, 7272)

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