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발행년	- (예 : 2010-2015)

전체선택

Fully-depleted SOI technology using high-k and single-metal gate for 32 nm node LSTP applications featuring 0.179 μm2 6T-SRAM bitcell

Conference

Fenouillet-Beranger, C.; Denorme, S.; Icard, B.; Boeuf, F.; Coignus, J.; Faynot, O.; Brevard, L.; Buj, C.; Soonekindt, C.; Todeschini, J.; Le-Denmat, J.C.; Loubet, N.; Gallon, C.; Perreau, P.; Manakli, S.; Minghetti, B.; Pain, L.; Arnal, V.; Vandooren, A.; Aime, D.; Tosti, L.; Savardi, C.; Broekaart, M.; Gouraud, P.; Leverd, F.; Dejonghe, V.; Brun, P.; Guillermet, M.; Aminpur, M.; Barnola, S.; Rouppert, F.; Martin, F.; Salvetat, T.; Lhostis, S.; Laviron, C.; Auriac, N.; Kormann, T.; Chabanne, G.; Gaillard, S.; Belmont, O.; Laffosse, E.; Barge, D.; Zauner, A.; Tarnowka, A.; Romanjec, K.; Brut, H.; Lagha, A.; Bonnetier, S.; Joly, F.; Mayet, N.; Cathignol, A.; Galpin, D.; Pop, D.; Delsol, R.; Pantel, R.; Pionnier, F.; Thomas, G.; Bensahel, D.; Deleonibus, S.; Skotnicki, T.; Mingam, H.

2007 IEEE International Electron Devices Meeting Electron Devices Meeting, 2007. IEDM 2007. IEEE International. :267-270 Dec, 2007

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Metrology and Optical Characterization of Plasma Enhanced Chemical Vapor Deposition, (PECVD), low temperature deposited Amorphous Carbon films.

Conference

Ferrieu, F.; Chaton, C.; Neira, D.; Beitia, C.; Mota, L. Proenca; Papon, A. M.; Tarnowka, A.

AIP Conference Proceedings. 9/26/2007, Vol. 931 Issue 1, p99-104. 6p. 4 Diagrams, 1 Chart, 2 Graphs.

Full Text (AIP) Find it@PNU

Mechanical and electrical analysis of strained liner effect in 35 nm fully depleted silicon-on-insulator devices with ultra thin silicon channels

Academic Journal

Gallon, C.; Denorme, S.; Boeuf, F.; Fiori, V.; Loubet, N.; Gouraud, P.; Leverd, F.; Imbert, G.; Garnier, P.; Bernard, H.; Pantel, R.; Pionnier, F.; Skotnicki, T.; Fenouillet-Beranger, C.; Chaton, C.; Laviron, C.; Vandooren, A.; Kormann, T.; Broekaart, M.; Gabette, L.; Vigilant, F.; Tarnowka, A.; Jullian, S.; Cristoloveanu, S.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. (Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 25 April 2006, 45(4 B):3058-3063)

Full Text (IOP) Web of Science JCR 저널정보 Scopus Find it@PNU

Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool

Academic Journal

Boher, P.; Piel, J.P.; Stehle, J.L.; Pickering, C.; Tarnowka, A.

In: Proceedings of SPIE - The International Society for Optical Engineering. (Proceedings of SPIE - The International Society for Optical Engineering, 2001, 4449:79-89)

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Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool

Academic Journal

Pickering, C.; Tarnowka, A.; Boher, P.; Piel, J.P.; Evrard, P.; Stehle, J.L.

In: Proceedings of SPIE - The International Society for Optical Engineering. (Proceedings of SPIE - The International Society for Optical Engineering, 23 August 2000, 4182(1):115-123)

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Cu/low-k thickness measurement for advanced Cu CMP process development and control

Conference

Li, Y.-L.; Heylen, N.; Delande, T.; Kellens, K.; Ong, P.; Leunissen, L.H.A.; Tarnowka, A.; Eliyahu, A.

In: ECS Transactions, ECS Transactions - ISTC/CSTIC 2009 (CISTC). (ECS Transactions, 2009, 18(1 PART 1):453-458)

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