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Silicide pre-clean effects on NiPtSi thermal stability for 65 nm technologies and beyond

Document Type

Article

Author

Bonnetier, S.; Anilturk, O.; Barr, A.; Mayet, N.; Imbert, B.; Hopstaken, M.; Barge, D.; Galpin, D.; Zoll, S.; Sicurani, E.; Caillat, C.; Gonella, R.; Espinoux, Y.; Gotti, A.; Basso, M.-T.; Gwoziecki, R.; Mur, P.

Source

In: Microelectronic Engineering. (Microelectronic Engineering, November 2007, 84(11):2528-2532)

Subject

Language

English

ISSN

01679317

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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