학술논문

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발행년	- (예 : 2010-2015)

전체선택

Excursion prevention strategy to increase chip performance by wafer intra-field cd control using photomask tuning

Conference

Sharoni, O.; Sufrin, Y.; Cohen, A.; Scheruebl, T.; Seltmann, R.; Samy, A.N.; Thamm, T.

In: ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings, 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2020. (ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings, August 2020, 2020-August)

Full Text (IEEE) Scopus Find it@PNU

Hot spot variability and lithography process window investigation by CDU improvement using CDC technique

Conference

Thamm, T.; Seltmann, R.; Samy, A.N.; Kaufmann, M.D.; Bitensky, A.; Geh, B.; Sczyrba, M.

In: Proceedings of SPIE - The International Society for Optical Engineering, Optical Microlithography XXXI. (Proceedings of SPIE - The International Society for Optical Engineering, 2018, 10587)

Scopus Find it@PNU

Challenges in process marginality for advanced technology nodes and tackling its contributors

Conference

Samy, A.N.; Schiwon, R.; Seltmann, R.; Kahlenberg, F.; Katakamsetty, U.

In: Proceedings of SPIE - The International Society for Optical Engineering, 29th European Mask and Lithography Conference. (Proceedings of SPIE - The International Society for Optical Engineering, 2013, 8886)

Scopus Find it@PNU

Role of 3D photo-resist simulation for advanced technology nodes

Conference

Samy, A.N.; Seltmann, R.; Kahlenberg, F.; Schramm, J.; Küchler, B.; Klostermann, U.

In: Proceedings of SPIE - The International Society for Optical Engineering, Optical Microlithography XXVI. (Proceedings of SPIE - The International Society for Optical Engineering, 2013, 8683)

Scopus Find it@PNU

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