학술논문
'학술논문'
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Conference
Raghunathan, U. S.; Sirohi, S.; Ruparelia, V.; Sharma, P. K.; Ioannou, D. P.; Jain, V.; Kakara, H. K.; Gedela, S.; Vanukuru, V.; Dongmo, P.; Luce, C.; Hazbun, R.; Krishnasamy, R.; Hwang, J.; Levy, M.; Welch, K.; Liu, S.; Cucci, B.; Cole, S.; Kantarovsky, J.; Vallett, A.; McCallum-Cook, I.; Yu, M.; Phelps, R.; Divergilio, A.; Sturm, A.; Peters, M.; Johnson, S.; Rassel, R.; Lagerquist, M.; Kerbaugh, M.; Newton, K.; Pekarik, J.; Liu, Q.
2022 IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS) BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS), 2022 IEEE. :232-235 Oct, 2022
Conference
Ramanathan, E.; Jiang, L.; Takmeel, Q.; MaryClaire, S.; Mahalingam, A.K.M.; Ghosh, S.; Donegan, K.; Chandrasekar, A.; Singh, S.; Johanson, H.; Damjanovic, D.; Sun, Z.; Sircar, A.; Eah, S.-K.; Bombardier, C.; DaSilva, A.; O'Brien, B.; Roux, A.; Cucci, B.; Christopher, O.; Montgomery, C.; Venkatasubramanian, V.; Rana, V.; Mody, J.; Shepard, J.; Child, C.; Morganfeld, B.; Sheraw, R.
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) Advanced Semiconductor Manufacturing Conference (ASMC), 2019 30th Annual SEMI. :1-4 May, 2019
Conference
Feilchenfeld, N. B.; Anderson, F. G.; Barwicz, T.; Chilstedt, S.; Ding, Y.; Ellis-Monaghan, J.; Gill, D. M.; Hedges, C.; Hofrichter, J.; Horst, F.; Khater, M.; Kiewra, E.; Leidy, R.; Martin, Y.; McLean, K.; Nicewicz, M.; Orcutt, J. S.; Porth, B.; Proesel, J.; Reinholm, C.; Rosenberg, J. C.; Sacher, W. D.; Stricker, A. D.; Whiting, C.; Xiong, C.; Agrawal, A.; Baker, F.; Baks, C. W.; Cucci, B.; Dang, D.; Doan, T.; Doany, F.; Engelmann, S.; Gordon, M.; Joseph, E.; Maling, J.; Shank, S.; Tian, X.; Willets, C.; Ferrario, J.; Meghelli, M.; Libsch, F.; Offrein, B.; Green, W. M. J.; Haensch, W.
2015 IEEE International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2015 IEEE International. :25.7.1-25.7.4 Dec, 2015
Periodical
Engelmann, Sebastian U.; Wise, Rich S.; Feilchenfeld, N. B.; Nummy, K.; Barwicz, T.; Gill, D.; Kiewra, E.; Leidy, R.; Orcutt, J. S.; Rosenberg, J.; Stricker, A. D.; Whiting, C.; Ayala, J.; Cucci, B.; Dang, D.; Doan, T.; Ghosal, M.; Khater, M.; McLean, K.; Porth, B.; Sowinski, Z.; Willets, C.; Xiong, C.; Yu, C.; Yum, S.; Giewont, K.; Green, W. M. J.
Proceedings of SPIE; April 2017, Vol. 10149 Issue: 1 p101490D-101490D-9, 913420p
Conference
Feilchenfeld, N.B.; Kiewra, E.; Leidy, R.; Stricker, A.D.; Whiting, C.; Ayala, J.; Cucci, B.; Dang, D.; Doan, T.; McLean, K.; Porth, B.; Willets, C.; Xiong, C.; Yum, S.; Nummy, K.; Sowinski, Z.; Yu, C.; Giewont, K.; Barwicz, T.; Gill, D.; Orcutt, J.S.; Rosenberg, J.; Khater, M.; Green, W.M.J.; Ghosal, M.
In: Proceedings of SPIE - The International Society for Optical Engineering , Advanced Etch Technology for Nanopatterning VI. (Proceedings of SPIE - The International Society for Optical Engineering, 2017, 10149)
Conference
In: ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings , 25th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2014. (ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings, 2014, :384-388)
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[AR] Cucci, B.
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