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Mask innovations on the eve of high NA EUV lithography

Document Type

Review

Author

Philipsen, V.; Frommhold, A.; Thakare, D.; Libeert, G.; Lee, I.; Franke, J.-H.; Bekaert, J.; Van Look, L.; Pellens, N.; De Bisschop, P.; Jonckheere, R.; Kovalevich, T.; Wiaux, V.; Hendrickx, E.

Source

In: Japanese Journal of Applied Physics. (Japanese Journal of Applied Physics, 1 April 2024, 63(4))

Subject

Language

English

ISSN

13474065
00214922

Online Access

Web of Science JCR 저널정보 Scopus Find it@PNU

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