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Transfer etching of bilayer resists in oxygen-based plasmas.

Document Type

Article

Author

Mahorowala, A. P.; Babich, K.; Lin, Q.; Medeiros, D. R.; Petrillo, K.; Simons, J.; Angelopoulos, M.; Sooriyakumaran, R.; Hofer, D.; Reynolds, G. W.; Taylor, J. W.

Source

Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2000, Vol. 18 Issue 4, p1411-1419, 9p

Subject

Language

ISSN

07342101

Online Access

Full Text (AIP) Web of Science JCR 저널정보 Scopus Find it@PNU

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