학술논문
전자자료 공정이용 안내
우리 대학 도서관에서 구독·제공하는 모든 전자자료(데이터베이스, 전자저널, 전자책 등)는 국내외 저작권법과 출판사와의 라이선스 계약에 따라 엄격하게 보호를 받고 있습니다.
전자자료의 비정상적 이용은 출판사로부터의 경고, 서비스 차단, 손해배상 청구 등 학교 전체에 심각한 불이익을 초래할 수 있으므로, 아래의 공정이용 지침을 반드시 준수해 주시기 바랍니다.
공정이용 지침
- 전자자료는 개인의 학습·교육·연구 목적의 비영리적 사용에 한하여 이용할 수 있습니다.
- 합리적인 수준의 다운로드 및 출력만 허용됩니다. (일반적으로 동일 PC에서 동일 출판사의 논문을 1일 30건 이하 다운로드할 것을 권장하며, 출판사별 기준에 따라 다를 수 있습니다.)
- 출판사에서 제공한 논문의 URL을 수업 관련 웹사이트에 게재할 수 있으나, 출판사 원문 파일 자체를 복제·배포해서는 안 됩니다.
- 본인의 ID/PW를 타인에게 제공하지 말고, 도용되지 않도록 철저히 관리해 주시기 바랍니다.
불공정 이용 사례
- 전자적·기계적 수단(다운로딩 프로그램, 웹 크롤러, 로봇, 매크로, RPA 등)을 이용한 대량 다운로드
- 동일 컴퓨터 또는 동일 IP에서 단시간 내 다수의 원문을 집중적으로 다운로드하거나, 전권(whole issue) 다운로드
- 저장·출력한 자료를 타인에게 배포하거나 개인 블로그·웹하드 등에 업로드
- 상업적·영리적 목적으로 자료를 전송·복제·활용
- ID/PW를 타인에게 양도하거나 타인 계정을 도용하여 이용
- EndNote, Mendeley 등 서지관리 프로그램의 Find Full Text 기능을 이용한 대량 다운로드
- 출판사 콘텐츠를 생성형 AI 시스템에서 활용하는 행위(업로드, 개발, 학습, 프로그래밍, 개선 또는 강화 등)
위반 시 제재
- 출판사에 의한 해당 IP 또는 기관 전체 접속 차단
- 출판사 배상 요구 시 위반자 개인이 배상 책임 부담
'학술논문'
에서 검색결과 57건 | 목록
1~20
Academic Journal
Vonderach T; Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir Prelog Weg 1, 8093, Zurich, Switzerland.; Gundlach-Graham A; Department of Chemistry, Iowa State University, 2415 Osborn Drive, 1605 Gilman Hall, Ames, IA, 50011-1021, USA.; Günther D; Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir Prelog Weg 1, 8093, Zurich, Switzerland. guenther@inorg.chem.ethz.ch.
Publisher: Springer-Verlag Country of Publication: Germany NLM ID: 101134327 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1618-2650 (Electronic) Linking ISSN: 16182642 NLM ISO Abbreviation: Anal Bioanal Chem Subsets: MEDLINE; PubMed not MEDLINE
Academic Journal
Journal of the American Chemical Society. 134:7830-7841
Academic Journal
The International Archives of the Photogrammetry, Remote Sensing and Spatial Information Sciences, Vol XXXIX-B8, Pp 451-456 (2012)
Academic Journal
International Journal of Mass Spectrometry. :183-188
Academic Journal
International Journal of Remote Sensing. 33:6652-6667
Academic Journal
Zeitschrift für Gastroenterologie. 47:273-276
Academic Journal
Tsuchiya, Y; Byrne, DP; Burgess, SG; Bormann, J; Baković, J; Huang, Y; Zhyvoloup, A; Yu, BYK; Peak-Chew, S; Tran, T; Bellany, F; Tabor, AB; Chan, AWE; Guruprasad, L; Garifulin, O; Filonenko, V; Vonderach, M; Ferries, S; Eyers, CE; Carroll, J; Skehel, M; Bayliss, R; Eyers, PA; Gout, I
Redox Biol
Redox Biology, Vol 28, Iss, Pp-(2020)
Redox Biology, Vol 28, Iss, Pp-(2020)
Academic Journal
Vonderach T; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich Vladimir-Prelog-Weg 1 8093 Zurich Switzerland guenther@inorg.chem.ethz.ch.; Günther D; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich Vladimir-Prelog-Weg 1 8093 Zurich Switzerland guenther@inorg.chem.ethz.ch.
Publisher: Royal Society of Chemistry Country of Publication: England NLM ID: 8608254 Publication Model: eCollection Cited Medium: Print ISSN: 0267-9477 (Print) Linking ISSN: 02679477 NLM ISO Abbreviation: J Anal At Spectrom Subsets: PubMed not MEDLINE
Academic Journal
Hemmann JL; Institute of Microbiology, Department of Biology, ETH Zurich, Zurich, Switzerland. Electronic address: jethro.hemmann@leibniz-hki.de.; Keller P; Institute of Microbiology, Department of Biology, ETH Zurich, Zurich, Switzerland.; Hemmerle L; Institute of Microbiology, Department of Biology, ETH Zurich, Zurich, Switzerland.; Vonderach T; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich, Zurich, Switzerland.; Ochsner AM; Institute of Microbiology, Department of Biology, ETH Zurich, Zurich, Switzerland.; Bortfeld-Miller M; Institute of Microbiology, Department of Biology, ETH Zurich, Zurich, Switzerland.; Günther D; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich, Zurich, Switzerland.; Vorholt JA; Institute of Microbiology, Department of Biology, ETH Zurich, Zurich, Switzerland. Electronic address: jvorholt@ethz.ch.
Publisher: Elsevier Inc. on behalf of American Society for Biochemistry and Molecular Biology Country of Publication: United States NLM ID: 2985121R Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1083-351X (Electronic) Linking ISSN: 00219258 NLM ISO Abbreviation: J Biol Chem Subsets: MEDLINE
Academic Journal
Ochsner AM; Institute of Microbiology, Department of Biology, ETH Zurich, Vladimir-Prelog-Weg 1-5/10, Zurich, 8093, Switzerland.; Hemmerle L; Institute of Microbiology, Department of Biology, ETH Zurich, Vladimir-Prelog-Weg 1-5/10, Zurich, 8093, Switzerland.; Vonderach T; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir-Prelog-Weg 1-5/10, Zurich, 8093, Switzerland.; Nüssli R; Institute of Microbiology, Department of Biology, ETH Zurich, Vladimir-Prelog-Weg 1-5/10, Zurich, 8093, Switzerland.; Bortfeld-Miller M; Institute of Microbiology, Department of Biology, ETH Zurich, Vladimir-Prelog-Weg 1-5/10, Zurich, 8093, Switzerland.; Hattendorf B; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir-Prelog-Weg 1-5/10, Zurich, 8093, Switzerland.; Vorholt JA; Institute of Microbiology, Department of Biology, ETH Zurich, Vladimir-Prelog-Weg 1-5/10, Zurich, 8093, Switzerland.
Publisher: Blackwell Scientific Publications Country of Publication: England NLM ID: 8712028 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1365-2958 (Electronic) Linking ISSN: 0950382X NLM ISO Abbreviation: Mol Microbiol Subsets: MEDLINE
Academic Journal
Benin BM; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland.; McCall KM; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland.; Wörle M; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1, CH-8093 Zürich, Switzerland.; Borgeaud D; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1, CH-8093 Zürich, Switzerland.; Vonderach T; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1, CH-8093 Zürich, Switzerland.; Sakhatskyi K; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland.; Yakunin S; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland.; Günther D; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1, CH-8093 Zürich, Switzerland.; Kovalenko MV; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland.
Publisher: The Society Country of Publication: United States NLM ID: 9884133 Publication Model: Print-Electronic Cited Medium: Print ISSN: 0897-4756 (Print) Linking ISSN: 08974756 NLM ISO Abbreviation: Chem Mater Subsets: PubMed not MEDLINE
Academic Journal
Hampe, O.; Karpuschkin, T.; Vonderach, M.; Weis, P.; Yu, Y. M.; Gan, L. B.; Klopper, W.; Kappes, M. M.
Physical Chemistry Chemical Physics. 13:9818
Academic Journal
Brown R; Chemical Physics, Department of Physics , Chalmers University of Technology , 412 96 Gothenburg , Sweden.; Vorokhta M; Department of Surface and Plasma Science, Faculty of Mathematics and Physics , Charles University , V Holešovičkách 2 , 180 00 Prague 8 , Czech Republic.; Khalakhan I; Department of Surface and Plasma Science, Faculty of Mathematics and Physics , Charles University , V Holešovičkách 2 , 180 00 Prague 8 , Czech Republic.; Dopita M; Department of Condensed Matter Physics, Faculty of Mathematics and Physics , Charles University , Ke Karlovu 5 , 121 16 Prague , Czech Republic.; Vonderach T; Section for Surface Physics and Catalysis, Department of Physics , Technical University of Denmark , Lyngby 2800 , Denmark.; Skála T; Department of Surface and Plasma Science, Faculty of Mathematics and Physics , Charles University , V Holešovičkách 2 , 180 00 Prague 8 , Czech Republic.; Lindahl N; Chemical Physics, Department of Physics , Chalmers University of Technology , 412 96 Gothenburg , Sweden.; Matolínová I; Department of Surface and Plasma Science, Faculty of Mathematics and Physics , Charles University , V Holešovičkách 2 , 180 00 Prague 8 , Czech Republic.; Grönbeck H; Chemical Physics, Department of Physics , Chalmers University of Technology , 412 96 Gothenburg , Sweden.; Neyman KM; Departament de Ciència de Materials i Química Física & Institut de Química Teòrica i Computacional , Universitat de Barcelona , 08028 Barcelona , Spain.; ICREA (Institució Catalana de Recerca i Estudis Avançats) , 08010 Barcelona , Spain .; Matolín V; Department of Surface and Plasma Science, Faculty of Mathematics and Physics , Charles University , V Holešovičkách 2 , 180 00 Prague 8 , Czech Republic.; Wickman B; Chemical Physics, Department of Physics , Chalmers University of Technology , 412 96 Gothenburg , Sweden.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: MEDLINE; PubMed not MEDLINE
Academic Journal
Vonderach T; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir-Prelog-Weg 1, Zurich 8093, Switzerland.; Hattendorf B; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir-Prelog-Weg 1, Zurich 8093, Switzerland.; Günther D; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir-Prelog-Weg 1, Zurich 8093, Switzerland.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 0370536 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1520-6882 (Electronic) Linking ISSN: 00032700 NLM ISO Abbreviation: Anal Chem Subsets: MEDLINE; PubMed not MEDLINE
Academic Journal
Hemmerle L; Institute of Microbiology, Department of Biology, ETH Zurich, Zurich, Switzerland.; Ochsner AM; Institute of Microbiology, Department of Biology, ETH Zurich, Zurich, Switzerland.; Vonderach T; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich, Zurich, Switzerland.; Hattendorf B; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich, Zurich, Switzerland.; Vorholt JA; Institute of Microbiology, Department of Biology, ETH Zurich, Zurich, Switzerland. Electronic address: jvorholt@ethz.ch.
Publisher: Academic Press Country of Publication: United States NLM ID: 0212271 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1557-7988 (Electronic) Linking ISSN: 00766879 NLM ISO Abbreviation: Methods Enzymol Subsets: MEDLINE
Academic Journal
In: Helvetica Chimica Acta . (Helvetica Chimica Acta, January 2021, 104(1))
Academic Journal
Hartl J; ETH Zurich, Institute of Microbiology, Zurich, Switzerland. hartlj@ethz.ch.; Kiefer P; ETH Zurich, Institute of Microbiology, Zurich, Switzerland.; Kaczmarczyk A; Biozentrum of the University of Basel, Basel, Switzerland.; Mittelviefhaus M; ETH Zurich, Institute of Microbiology, Zurich, Switzerland.; Meyer F; ETH Zurich, Institute of Microbiology, Zurich, Switzerland.; Vonderach T; ETH Zurich, Laboratory of Inorganic Chemistry, Zurich, Switzerland.; Hattendorf B; ETH Zurich, Laboratory of Inorganic Chemistry, Zurich, Switzerland.; Jenal U; Biozentrum of the University of Basel, Basel, Switzerland.; Vorholt JA; ETH Zurich, Institute of Microbiology, Zurich, Switzerland. jvorholt@ethz.ch.
Publisher: Springer Nature Country of Publication: Germany NLM ID: 101736592 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 2522-5812 (Electronic) Linking ISSN: 25225812 NLM ISO Abbreviation: Nat Metab
Academic Journal
Shoshan MS; Laboratory of Organic Chemistry, D-CHAB, ETH Zurich, Vladimir-Prelog-Weg 3, 8093, Zurich, Switzerland.; Vonderach T; Laboratory of Inorganic Chemistry, D-CHAB, ETH Zurich, Vladimir-Prelog-Weg 1, 8093, Zurich, Switzerland.; Hattendorf B; Laboratory of Inorganic Chemistry, D-CHAB, ETH Zurich, Vladimir-Prelog-Weg 1, 8093, Zurich, Switzerland.; Wennemers H; Laboratory of Organic Chemistry, D-CHAB, ETH Zurich, Vladimir-Prelog-Weg 3, 8093, Zurich, Switzerland.
Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 0370543 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1521-3773 (Electronic) Linking ISSN: 14337851 NLM ISO Abbreviation: Angew Chem Int Ed Engl Subsets: MEDLINE
Academic Journal
Schindler Z; Chair of Forest Growth and Dendroecology, University of Freiburg, Freiburg im Breisgau, Germany.; Larysch E; Chair of Forest Growth and Dendroecology, University of Freiburg, Freiburg im Breisgau, Germany.; Fornoff F; Chair of Nature Conservation and Landscape Ecology, University of Freiburg, Freiburg im Breisgau, Germany.; Kröner K; Chair of Forest Growth and Dendroecology, University of Freiburg, Freiburg im Breisgau, Germany.; Obladen N; Chair of Forest Growth and Dendroecology, University of Freiburg, Freiburg im Breisgau, Germany.; Klein AM; Chair of Nature Conservation and Landscape Ecology, University of Freiburg, Freiburg im Breisgau, Germany.; Seifert T; Chair of Forest Growth and Dendroecology, University of Freiburg, Freiburg im Breisgau, Germany.; Department of Forest and Wood Science, Stellenbosch University, Stellenbosch, South Africa.; Vonderach C; Chair of Forest Growth and Dendroecology, University of Freiburg, Freiburg im Breisgau, Germany.; Department of Biometry and Informatics, Forest Research Institute Baden-Württemberg, Freiburg im Breisgau, Germany.; Morhart C; Chair of Forest Growth and Dendroecology, University of Freiburg, Freiburg im Breisgau, Germany.
Publisher: Ecological Society of America Country of Publication: United States NLM ID: 0043541 Publication Model: Print Cited Medium: Internet ISSN: 1939-9170 (Electronic) Linking ISSN: 00129658 NLM ISO Abbreviation: Ecology Subsets: MEDLINE
검색 결과 제한하기
제한된 항목
[검색어] Vonderach, T.
발행연도 제한
-
학술DB(Database Provider)
저널명(출판물, Title)
출판사(Publisher)
자료유형(Source Type)
주제어
언어