학술논문
전자자료 공정이용 안내
우리 대학 도서관에서 구독·제공하는 모든 전자자료(데이터베이스, 전자저널, 전자책 등)는 국내외 저작권법과 출판사와의 라이선스 계약에 따라 엄격하게 보호를 받고 있습니다.
전자자료의 비정상적 이용은 출판사로부터의 경고, 서비스 차단, 손해배상 청구 등 학교 전체에 심각한 불이익을 초래할 수 있으므로, 아래의 공정이용 지침을 반드시 준수해 주시기 바랍니다.
공정이용 지침
- 전자자료는 개인의 학습·교육·연구 목적의 비영리적 사용에 한하여 이용할 수 있습니다.
- 합리적인 수준의 다운로드 및 출력만 허용됩니다. (일반적으로 동일 PC에서 동일 출판사의 논문을 1일 30건 이하 다운로드할 것을 권장하며, 출판사별 기준에 따라 다를 수 있습니다.)
- 출판사에서 제공한 논문의 URL을 수업 관련 웹사이트에 게재할 수 있으나, 출판사 원문 파일 자체를 복제·배포해서는 안 됩니다.
- 본인의 ID/PW를 타인에게 제공하지 말고, 도용되지 않도록 철저히 관리해 주시기 바랍니다.
불공정 이용 사례
- 전자적·기계적 수단(다운로딩 프로그램, 웹 크롤러, 로봇, 매크로, RPA 등)을 이용한 대량 다운로드
- 동일 컴퓨터 또는 동일 IP에서 단시간 내 다수의 원문을 집중적으로 다운로드하거나, 전권(whole issue) 다운로드
- 저장·출력한 자료를 타인에게 배포하거나 개인 블로그·웹하드 등에 업로드
- 상업적·영리적 목적으로 자료를 전송·복제·활용
- ID/PW를 타인에게 양도하거나 타인 계정을 도용하여 이용
- EndNote, Mendeley 등 서지관리 프로그램의 Find Full Text 기능을 이용한 대량 다운로드
- 출판사 콘텐츠를 생성형 AI 시스템에서 활용하는 행위(업로드, 개발, 학습, 프로그래밍, 개선 또는 강화 등)
위반 시 제재
- 출판사에 의한 해당 IP 또는 기관 전체 접속 차단
- 출판사 배상 요구 시 위반자 개인이 배상 책임 부담
'학술논문'
에서 검색결과 223건 | 목록
1~20
Conference
Luby, S.; Jergel, M.; Benkovicova, M.; Siffalovic, P.; Ivanco, J.; Vegso, K.; Majkova, E.; Rella, R.; Manera, M. G.; Capone, S.; Vavra, I.
The Tenth International Conference on Advanced Semiconductor Devices and Microsystems Advanced Semiconductor Devices & Microsystems (ASDAM), 2014 10th International Conference on. :1-4 Oct, 2014
News
Nanotechnology Weekly. May 9, 2016, p418.
Academic Journal
Held V; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, 845 11 Bratislava, Slovakia.; Mrkyvkova N; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, 845 11 Bratislava, Slovakia.; Center for Advanced Materials Application, Slovak Academy of Sciences, Dúbravská cesta 9, 845 11 Bratislava, Slovakia.; Halahovets Y; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, 845 11 Bratislava, Slovakia.; Center for Advanced Materials Application, Slovak Academy of Sciences, Dúbravská cesta 9, 845 11 Bratislava, Slovakia.; Nádaždy P; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, 845 11 Bratislava, Slovakia.; Institute of Electrical Engineering, Slovak Academy of Sciences, Dúbravská cesta 9, 845 11 Bratislava, Slovakia.; Vegso K; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, 845 11 Bratislava, Slovakia.; Center for Advanced Materials Application, Slovak Academy of Sciences, Dúbravská cesta 9, 845 11 Bratislava, Slovakia.; Vlk A; Laboratory of Thin Films, Institute of Physics, ASCR, Cukrovarnická 10, 162 00 Prague, Czech Republic.; Ledinský M; Laboratory of Thin Films, Institute of Physics, ASCR, Cukrovarnická 10, 162 00 Prague, Czech Republic.; Chumakov A; Photon Science, Deutsches Elektronen-Synchrotron (DESY), Notkestr. 85, 22607 Hamburg, Germany.; Schwartzkopf M; Photon Science, Deutsches Elektronen-Synchrotron (DESY), Notkestr. 85, 22607 Hamburg, Germany.; Schreiber F; Institute of Applied Physics, University of Tübingen, 72076 Tübingen, Germany.; Siffalovic P; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, 845 11 Bratislava, Slovakia.; Center for Advanced Materials Application, Slovak Academy of Sciences, Dúbravská cesta 9, 845 11 Bratislava, Slovakia.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: PubMed not MEDLINE; MEDLINE
News
Science Letter. January 13, 2012, p1993.
Academic Journal
Zhu T; Institut de Recherche de Chimie Paris (IRCP), Chimie ParisTech, PSL Research University, CNRS, UMR8247, 11 rue P. et M. Curie, F-75005 Paris, France.; Liu M; Institut de Recherche de Chimie Paris (IRCP), Chimie ParisTech, PSL Research University, CNRS, UMR8247, 11 rue P. et M. Curie, F-75005 Paris, France.; Cresp M; Institut de Recherche de Chimie Paris (IRCP), Chimie ParisTech, PSL Research University, CNRS, UMR8247, 11 rue P. et M. Curie, F-75005 Paris, France.; Zheng D; Institut de Recherche de Chimie Paris (IRCP), Chimie ParisTech, PSL Research University, CNRS, UMR8247, 11 rue P. et M. Curie, F-75005 Paris, France.; Vegso K; Institute of Physics, Slovak Academy of Sciences, Dubravska Cesta 9, 84511 Bratislava, Slovakia.; Center for Advanced Materials and Applications (CEMEA), Slovak Academy of Sciences, Dubravska Cesta 5807/9, 84511 Bratislava, Slovakia.; Siffalovic P; Institute of Physics, Slovak Academy of Sciences, Dubravska Cesta 9, 84511 Bratislava, Slovakia.; Center for Advanced Materials and Applications (CEMEA), Slovak Academy of Sciences, Dubravska Cesta 5807/9, 84511 Bratislava, Slovakia.; Pauporté T; Institut de Recherche de Chimie Paris (IRCP), Chimie ParisTech, PSL Research University, CNRS, UMR8247, 11 rue P. et M. Curie, F-75005 Paris, France.
Publisher: MDPI AG Country of Publication: Switzerland NLM ID: 101610216 Publication Model: Electronic Cited Medium: Print ISSN: 2079-4991 (Print) Linking ISSN: 20794991 NLM ISO Abbreviation: Nanomaterials (Basel) Subsets: PubMed not MEDLINE
Academic Journal
Kozak A.; Sojkova M.; Gucmann F.; Bodik M.; Vegso K.; Dobrocka E.; Pis I.; Bondino F.; Hulman M.; Siffalovic P.; Tapajna M.
Applied Surface Science
Academic Journal
Mravec B; Department of Organic Chemistry, Faculty of Natural Sciences, Comenius University, Ilkovičova 6, Bratislava SK-842 15, Slovakia.; Budzák Š; Department of Chemistry, Faculty of Natural Sciences, Matej Bel University, Tajovského 40, Banská Bystrica SK-974 01, Slovakia.; Medved' M; Department of Chemistry, Faculty of Natural Sciences, Matej Bel University, Tajovského 40, Banská Bystrica SK-974 01, Slovakia.; Regional Centre of Advanced Technologies and Materials, Czech Advanced Technology and Research Institute (CATRIN), Palacký University Olomouc, Šlechtitelů 27, 779 00 Olomouc, Czech Republic.; Pašteka LF; Department of Physical and Theoretical Chemistry, Faculty of Natural Sciences, Comenius University, Ilkovičova 6, SK-842 15 Bratislava, Slovakia.; Van Swinderen Institute for Particle Physics and Gravity, University of Groningen, Nijenborgh 3, 9747 AG Groningen, The Netherlands.; Lazar P; Regional Centre of Advanced Technologies and Materials, Czech Advanced Technology and Research Institute (CATRIN), Palacký University Olomouc, Šlechtitelů 27, 779 00 Olomouc, Czech Republic.; Procházková E; Institute of Organic Chemistry and Biochemistry, Czech Academy of Sciences, Flemingovo nám. 2, CZ-160 00 Prague, Czech Republic.; Růžička A; Department of General and Inorganic Chemistry, Faculty of Chemical Technology, University of Pardubice, Studentská 573, CZ-532 10 Pardubice, Czech Republic.; Kožíšek J; Department of Physical Chemistry, Faculty of Chemical and Food Technology, Slovak University of Technology, Radlinského 9, SK-81237 Bratislava, Slovakia.; Vegso K; Center for Advanced Materials and Applications (CEMEA), Slovak Academy of Sciences, Dubravska cesta 5807/9, SK-84511 Bratislava, Slovakia.; Bodik M; Center for Advanced Materials and Applications (CEMEA), Slovak Academy of Sciences, Dubravska cesta 5807/9, SK-84511 Bratislava, Slovakia.; Šiffalovič P; Center for Advanced Materials and Applications (CEMEA), Slovak Academy of Sciences, Dubravska cesta 5807/9, SK-84511 Bratislava, Slovakia.; Švec P; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, SK-845 11 Bratislava, Slovakia.; Filo J; Department of Organic Chemistry, Faculty of Natural Sciences, Comenius University, Ilkovičova 6, Bratislava SK-842 15, Slovakia.; Cigáň M; Department of Organic Chemistry, Faculty of Natural Sciences, Comenius University, Ilkovičova 6, Bratislava SK-842 15, Slovakia.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 7503056 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1520-5126 (Electronic) Linking ISSN: 00027863 NLM ISO Abbreviation: J Am Chem Soc Subsets: PubMed not MEDLINE; MEDLINE
Academic Journal
Vegso, K.; Siffalovic, P.; Jergel, M.; Weis, M.; Benkovicova, M.; Majkova, E.; Luby, S.; Kocsis, T.; Capek, I.
Langmuir 28, 9395-9404 (2012). doi:10.1021/la301577a
Academic Journal
Vegso, K.; Siffalovic, P.; Weis, M.; Jergel, M.; Benkovicova, M.; Majkova, E.; Chitu, L.; Halahovets, Y.; Luby, S.; Capek, I.; Satka, A.
Physica status solidi / A 208, 2629 (2011). doi:10.1002/pssa.201184275
Academic Journal
In: Chemical Engineering Journal . (Chemical Engineering Journal, 1 February 2025, 505)
Academic Journal
Siffalovic, P.; Chitu, L.; Majkova, E.; Vegso, K.; Jergel, M.; Luby, S.; Capek, I.; Satka, A.; Maier, G. A.; Keckes, J.; Timmann, A.; Roth, S. V.
Langmuir 26, 5451 (2010). doi:10.1021/la904636g
Academic Journal
Ayyanusamy, P.; Vegso, K.; Halahovets, Y.; Nadazdy, P.; Raza, M.A.; Jergel, M.; Siffalovic, P.; Simon, E.; Devaux, D.; Aguadero, A.; Artal, R.; Villaluenga, I.; Corral, O.P.; Hilhorst, J.; de Heer, T.
In: Energy Technology . (Energy Technology, 2025)
Academic Journal
Siffalovic P.; Vegso K.; Jergel M.; Majkova E.; Keckes J.; Maier G.; Cornejo M.; Ziberi B.; Frost F.; Hasse B.; Wiesmann J.
Measurement Science Review, Vol 10, Iss 5, Pp 153-156 (2010)
Academic Journal
Chitu L.; Siffalovic P.; Majkova E.; Jergel M.; Vegso K.; Luby S.; Capek I.; Satka A.; Perlich J.; Timmann A.; Roth S.; Keckes J.; Maier G.
Measurement Science Review, Vol 10, Iss 5, Pp 162-165 (2010)
Academic Journal
Held V; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, Bratislava 845 11, Slovakia.; Mrkyvkova N; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, Bratislava 845 11, Slovakia.; Center for Advanced Materials Application, Slovak Academy of Sciences, Dúbravská cesta 9, Bratislava 845 11, Slovakia.; Halahovets Y; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, Bratislava 845 11, Slovakia.; Nádaždy P; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, Bratislava 845 11, Slovakia.; Institute of Electrical Engineering, Slovak Academy of Sciences, Dúbravská cesta 9, Bratislava 845 11, Slovakia.; Vegso K; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, Bratislava 845 11, Slovakia.; Center for Advanced Materials Application, Slovak Academy of Sciences, Dúbravská cesta 9, Bratislava 845 11, Slovakia.; Vlk A; Laboratory of Thin Films, Institute of Physics, ASCR, Cukrovarnická 10, Prague 162 00, Czech Republic.; Ledinský M; Laboratory of Thin Films, Institute of Physics, ASCR, Cukrovarnická 10, Prague 162 00, Czech Republic.; Jergel M; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, Bratislava 845 11, Slovakia.; Center for Advanced Materials Application, Slovak Academy of Sciences, Dúbravská cesta 9, Bratislava 845 11, Slovakia.; Bernstorff S; Elettra-Sincrotrone Trieste S. C.p.A, Basovizza, Trieste 34149, Italy.; Keckes J; Department of Materials Science, Montanuniversität Leoben, Leoben A-8700, Austria.; Schreiber F; Institute of Applied Physics, University of Tübingen, Tübingen 72076, Germany.; Siffalovic P; Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, Bratislava 845 11, Slovakia.; Center for Advanced Materials Application, Slovak Academy of Sciences, Dúbravská cesta 9, Bratislava 845 11, Slovakia.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: PubMed not MEDLINE; MEDLINE
Academic Journal
Wang, T.; Chen, Y.; Feng, F.; Zheng, D.; Pauporté, T.; Baillard, G.; Coolen, L.; Vegso, K.; Nadazdy, P.; Mrkyvkova, N.; Siffalovic, P.
In: Chemical Engineering Journal . (Chemical Engineering Journal, 15 May 2024, 488)
Conference
9th Research Course on New X-ray Sciences Disordered Materials in Synchrotron and XFEL X-ray Light, Hamburg, Germany, 2010-02-17-2010-02-19
Academic Journal
Guesnay, Q.; Artuk, K.; Turkay, D.; Kuba, A.G.; Fürst, N.; Bucher, C.; Ballif, C.; Wolff, C.M.; Sahli, F.; Schafflützel, A.; Jeangros, Q.; Mrkyvkova, N.; Vegso, K.; Siffalovic, P.; Schreiber, F.; Lai, H.; Fu, F.; Ledinský, M.
In: Advanced Energy Materials . (Advanced Energy Materials, 8 March 2024, 14(10))
Conference
Siffalovic, P.; Vegso, K.; Jergel, M.; Majkova, E.; Szymanski, B.; Stobiecki, F.; Roth, S. V.; Perlich, J.
7th International Conference on Solid State Surfaces and Interfaces, SSSI-VII, Smolenice, Slovakia, 2010-11-20-2010-11-25
Academic Journal
검색 결과 제한하기
제한된 항목
[검색어] Vegso, K.
발행연도 제한
-
학술DB(Database Provider)
저널명(출판물, Title)
출판사(Publisher)
자료유형(Source Type)
주제어
언어