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발행년	- (예 : 2010-2015)

Collapse-free patterning of high aspect ratio silicon structures for 20nm NAND Flash technology

Conference

Iyengar, Vikram V.; Chandrasekaran, Suresh; Weddington, Darryl; Nettles, Monte M.; Eagle, Oliver H.; Tey, Shin Hwee; Parry, Thad B.

2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) Advanced Semiconductor Manufacturing Conference (ASMC), 2015 26th Annual SEMI. :53-57 May, 2015

Full Text (IEEE) Find it@PNU

Practical considerations in Megasonic Wafer Cleaning

Academic Journal

Hall, R. Mark; Jarvis, Taura; Parry, Thad

MRS Online Proceedings Library. 477(1):15-20

Find it@PNU

Turnabout Is Fair Play.

Periodical

Caruso, Lisa

National Journal. 4/1/2006, Vol. 38 Issue 13, p62-62. 1/8p.

Full Text (Gale Academic Onefile) Full Text (ProQuest Central) Full Text (Gale General Onefile) Find it@PNU

Investigating particle, metallic depositions in megasonic wafer cleaning

Periodical

Hall, R. Mark; Jarvis, Taura D.; Parry, Thad; Li, Li; Hawthorne, Rick C.

Micro. July-August, 1996, Vol. v14 Issue n7, p81, 6 p.

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List of Contributors

Editorial & Opinion

Anders, Niels Steven; Anderson, Ian; Benetti, Sara; Brasington, James; Brunsden, Denys; Cestari, Antonello; Claessens, Lieven; Clarke, Jonathan D.A.; Dramis, Francesco; Dunlop, Paul; Geilhausen, Martin; Griffiths, James S.; Guida, Domenico; Gustavsson, Marcus; Guth, Peter L.; Hart, Andrew B.; Hayakawa, Yuichi; Hearn, Gareth J.; Hengl, Tomislav; Heyvaert, Vanessa M.A.; Hicks, Murray; Hillier, John K.; Höfle, Bernhard; Hunter, Graham; Jones, David K.C.; Knight, Jasper; Labrosse, Fred; Lee, E.Mark; Micallef, Aaron; Mitchell, Wishart A.; Neal, Mark; Ó Cofaigh, Colm; Oguchi, Takashi; Otto, Jan-Christoph; Pain, Colin F.; Paron, Paolo; Parry, Steve; Pfeifer, Norbert; Reynard, Emmanuel; Rose, James; Rutzinger, Martin; Sacchetti, Fabio; Seijmonsbergen, Arie Christoffel; Smith, Mike J.; Theler, David; Vericat, Damià; Verkinderen, Peter; Verstappen, Herman Theodore; Vetter, Michael; Walstra, Jan; Wasklewicz, Thad; Whitworth, Malcolm; Williams, Richard; Wong, Vanessa N.L.

In Developments in Earth Surface Processes 2011 15:xvii-xxi

Full Text (ScienceDirect 종량제) Scopus Find it@PNU

Patent

Open Access (USPTO) Find it@PNU

Reviews of Books

Periodical

James, Harold; Tuplin, Christopher; Levick, Barbara; Hudson, Mark J.; Heywood, Colin; Edbury, Peter W.; Osborne, Toby; Cormack, William S.; Kolfin, Elmer; Seed, Patricia; Waley-Cohen, Joanna; Baugh, Daniel A.; Whelan, Ruth; Best, Jacqueline; Eltis, David; Burnard, Trevor; Campbell, I. C.; Kirby, Dianne; Sinha, Manisha; La Vere, David; Frazier, Robert; Rawski, Evelyn S.; Burton, Antoinette; Meller, Helen; Youé, Christopher; Adelman, Howard; Roshwald, Aviel; French, David; Sheffield, Gary; Greenhalgh, Elizabeth; Kennedy, Greg; Reznick, Jeffrey S.; Deák, István; Cohen, Warren I.; Porter, Lewis; Allen, Michael Thad; De Grand, Alexander; Zeeman, Bert; Kitchen, Martin; Black, Gregory D.; Dunar, Andrew J.; Day, David; Duus, Peter; Madsen, Chris; Jespersen, T. Christopher; Brennan, Patrick H.; Hanhimäku, Jussi M.; Eckes, Alfred E.; Mouré, Kenneth; Lungu, Dov B.; Sheinin, David; Borstelmann, Thomas; Aronsen, Lawrence; McDowall, Duncan; McLeod, Mark W.; Mitchell, Nancy; Schmidtke, Oliver; Graber, Doris A.; Haney, Patrick J.; Corner, John; Hsu, Madeline Y.; Lebow, Richard Ned; Milward, Alan S.; Onuf, Nicholas; Falk, Richard; Farnham, Barbara; Smil, Vaclay; Steiner, Niklaus; Kelsey, Jane; Thayer, Bradley A.

International History Review; December 2006, Vol. 28 Issue: 4 p807-938, 132p

Web of Science JCR 저널정보 Scopus Find it@PNU

Surface photovoltage monitoring of silicon surface native and chemical oxides following wafer cleaning and rinsing operations

Conference

Rosato, John J.; Hall, R.Mark; Parry, Thad B.; Lindquist, Paul G.; Jarvis, Taura D.

In: Materials Research Society Symposium - Proceedings, Ultraclean Semiconductor Processing Technology and Surface Chemical Cleaning and Passivation. (Materials Research Society Symposium - Proceedings, 1995, 386:47-54)

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Effect of SC-1 process parameters on particle removal and surface metallic contamination

Conference

Hall, R.Mark; Rosato, John J.; Jarvis, Taura; Parry, Thad; Lindquist, Paul G.

In: Materials Research Society Symposium - Proceedings, Ultraclean Semiconductor Processing Technology and Surface Chemical Cleaning and Passivation. (Materials Research Society Symposium - Proceedings, 1995, 386:127-134)

Scopus Find it@PNU

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