부산대학교 도서관

Karpisz T; National Institute of Standards and Technology, Boulder, CO USA.; University of Colorado, Boulder, CO USA.; Lirette RL; National Institute of Standards and Technology, Boulder, CO USA.; University of Colorado, Boulder, CO USA.; Hagerstrom AM; National Institute of Standards and Technology, Boulder, CO USA.; Orloff ND; National Institute of Standards and Technology, Boulder, CO USA.; Stelson AC; National Institute of Standards and Technology, Boulder, CO USA.

Publisher: Springer Nature Country of Publication: England NLM ID: 101742113 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 2399-3650 (Electronic) Linking ISSN: 23993650 NLM ISO Abbreviation: Commun Phys Subsets: PubMed not MEDLINE

Woodcox M; Theiss Research, P.O. Box 127, La Jolla, California 92038, USA.; Material Measurement Laboratory, National Institute of Standards and Technology, 100 Bureau Dr., Gaithersburg, Maryland 20899, USA.; Evans SR; Colorado School of Mines, 1500 Illinois St., Golden, Colorado 80401, USA.; Communications Technology Laboratory, National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA.; Hagerstrom AM; Communications Technology Laboratory, National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA.; Bone RA; Theiss Research, P.O. Box 127, La Jolla, California 92038, USA.; Material Measurement Laboratory, National Institute of Standards and Technology, 100 Bureau Dr., Gaithersburg, Maryland 20899, USA.; Jungwirth NR; Material Measurement Laboratory, National Institute of Standards and Technology, 100 Bureau Dr., Gaithersburg, Maryland 20899, USA.; Communications Technology Laboratory, National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA.; Mattes S; Department of Chemistry and Chemical Biology, Cornell University, 410 Thurston Ave., Ithaca, New York 14850, USA.; Mahata A; Material Measurement Laboratory, National Institute of Standards and Technology, 100 Bureau Dr., Gaithersburg, Maryland 20899, USA.; Orloff ND; Communications Technology Laboratory, National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA.; Muzny C; Communications Technology Laboratory, National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA.; Booth JC; Communications Technology Laboratory, National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA.; Schwarz KA; Material Measurement Laboratory, National Institute of Standards and Technology, 100 Bureau Dr., Gaithersburg, Maryland 20899, USA.; Stelson AC; Communications Technology Laboratory, National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA.

Publisher: American Institute of Physics Country of Publication: United States NLM ID: 0375360 Publication Model: Print Cited Medium: Internet ISSN: 1089-7690 (Electronic) Linking ISSN: 00219606 NLM ISO Abbreviation: J Chem Phys Subsets: PubMed not MEDLINE; MEDLINE

Pawlik JT; National Institute of Standards and Technology, Boulder, CO 80305 USA.; Karpisz T; National Institute of Standards and Technology, Boulder, CO 80305 USA, and also with the University of Colorado Boulder, Boulder, CO 80309 USA.; Kazemipour Y; National Institute of Standards and Technology, Boulder, CO 80305 USA, and also with the Colorado School of Mines, Golden, CO 80401, USA.; Derimow N; National Institute of Standards and Technology, Boulder, CO 80305 USA.; Evans SR; National Institute of Standards and Technology, Boulder, CO 80305 USA, and also with the Colorado School of Mines, Golden, CO 80401, USA.; Bosworth BT; National Institute of Standards and Technology, Boulder, CO 80305 USA.; Booth JC; National Institute of Standards and Technology, Boulder, CO 80305 USA.; Orloff ND; National Institute of Standards and Technology, Boulder, CO 80305 USA.; Long CJ; National Institute of Standards and Technology, Boulder, CO 80305 USA.; Stelson AC; National Institute of Standards and Technology, Boulder, CO 80305 USA.

Publisher: Professional Technical Group on Microwave Theory and Techniques, Institute of Electrical and Electronics Engineers Country of Publication: United States NLM ID: 9879366 Publication Model: Print Cited Medium: Print ISSN: 0018-9480 (Print) Linking ISSN: 00189480 NLM ISO Abbreviation: IEEE Trans Microw Theory Tech Subsets: PubMed not MEDLINE

Orloff, ND; Mateu, J; Lewandowski, A; Rocas, E; King, J; Gu, DZ; Lu, XL; Collado, C; Takeuchi, I; Booth, JC

IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES
r-CTTC. Repositorio Institucional Producción Científica del Centre Tecnològic de Telecomunicacions de Catalunya (CTTC)
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r-CTTC: Repositorio Institucional Producción Científica del Centre Tecnològic de Telecomunicacions de Catalunya (CTTC)
Centre Tecnològic de Telecomunicacions de Catalunya (CTTC)

O. Trujillo; R. Moss; K.D. Vuong; D.H. Lee; R. Noble; D. Finnigan; S. Orloff; E. Tenpas; C. Park; J. Fagan; X.W. Wang

Thin Solid Films. :13-17

S. Orloff; Khanh D. Vuong; Eric W. Tenpas; J. G. Fagan; Xing W. Wang

SPIE Proceedings. 2716:205

Bergmann F; Communications Technology Laboratory, National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA.; Department of Physics, University of Colorado, Libby Dr, Boulder, Colorado 80302, USA.; Jungwirth NR; Communications Technology Laboratory, National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA.; Bosworth BT; Communications Technology Laboratory, National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA.; Cheron J; Communications Technology Laboratory, National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA.; Long CJ; Communications Technology Laboratory, National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA.; Orloff ND; Communications Technology Laboratory, National Institute of Standards and Technology, 325 Broadway, Boulder, Colorado 80305, USA.

Publisher: American Institute of Physics Country of Publication: United States NLM ID: 9881183 Publication Model: Print Cited Medium: Print ISSN: 0003-6951 (Print) Linking ISSN: 00036951 NLM ISO Abbreviation: Appl Phys Lett Subsets: PubMed not MEDLINE

Ryan HP; Cambridge University Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge CB2 1EW, U.K.; Fishman ZS; National Institute of Standards and Technology Communications Technology Laboratory, 325 Broadway, Boulder, Colorado 80305, United States.; Pawlik JT; National Institute of Standards and Technology Communications Technology Laboratory, 325 Broadway, Boulder, Colorado 80305, United States.; Grommet A; Cambridge University Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge CB2 1EW, U.K.; Musial M; National Institute of Standards and Technology Material Measurement Laboratory, 100 Bureau Dr., Gaithersburg, Maryland 20899, United States.; Rizzuto F; Cambridge University Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge CB2 1EW, U.K.; Booth JC; National Institute of Standards and Technology Communications Technology Laboratory, 325 Broadway, Boulder, Colorado 80305, United States.; Long CJ; National Institute of Standards and Technology Communications Technology Laboratory, 325 Broadway, Boulder, Colorado 80305, United States.; Schwarz K; National Institute of Standards and Technology Material Measurement Laboratory, 100 Bureau Dr., Gaithersburg, Maryland 20899, United States.; Orloff ND; National Institute of Standards and Technology Communications Technology Laboratory, 325 Broadway, Boulder, Colorado 80305, United States.; Nitschke JR; Cambridge University Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge CB2 1EW, U.K.; Stelson AC; National Institute of Standards and Technology Communications Technology Laboratory, 325 Broadway, Boulder, Colorado 80305, United States.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 7503056 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1520-5126 (Electronic) Linking ISSN: 00027863 NLM ISO Abbreviation: J Am Chem Soc Subsets: PubMed not MEDLINE; MEDLINE

Stelson AC; National Institute of Standards and Technology, Radio Frequency Electronics Group, Boulder CO 325 Broadway St, Boulder, CO, 80305, USA.; Liu M; School of Molecular Sciences, Arizona State University, 551 E University Dr, Tempe, AZ, 85281, USA.; Center for Molecular Design and Biomimetics, The Biodesign Institute, Arizona State University, 727 E. Tyler St., Tempe, AZ, 85281, USA.; Little CAE; National Institute of Standards and Technology, Radio Frequency Electronics Group, Boulder CO 325 Broadway St, Boulder, CO, 80305, USA.; Long CJ; National Institute of Standards and Technology, Radio Frequency Electronics Group, Boulder CO 325 Broadway St, Boulder, CO, 80305, USA.; Orloff ND; National Institute of Standards and Technology, Radio Frequency Electronics Group, Boulder CO 325 Broadway St, Boulder, CO, 80305, USA.; Stephanopoulos N; School of Molecular Sciences, Arizona State University, 551 E University Dr, Tempe, AZ, 85281, USA. nstepha1@asu.edu.; Center for Molecular Design and Biomimetics, The Biodesign Institute, Arizona State University, 727 E. Tyler St., Tempe, AZ, 85281, USA. nstepha1@asu.edu.; Booth JC; National Institute of Standards and Technology, Radio Frequency Electronics Group, Boulder CO 325 Broadway St, Boulder, CO, 80305, USA. james.booth@nist.gov.

Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101528555 Publication Model: Electronic Cited Medium: Internet ISSN: 2041-1723 (Electronic) Linking ISSN: 20411723 NLM ISO Abbreviation: Nat Commun Subsets: MEDLINE

Trujillo, O; Moss, R; Vuong, KD; Lee, DH; Noble, R; Finnigan, D; Orloff, S; Tenpas, E; Park, C; Fagan, J; Wang, XW

THIN SOLID FILMS; DEC 15 1996, 290 p13-p17, 5p.

MOISEEVA, IG; SEMENOVA, SK; BANNIKOVA, LV; FILIPPOVA, ND

GENETIKA; MAY 1994, 30 5, p681-p694, 14p.

Das S; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA. sujitdas@berkeley.edu.; Department of Physics, University of California, Berkeley, CA, USA. sujitdas@berkeley.edu.; Hong Z; Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA, USA.; Department of Mechanical Engineering, Carnegie Mellon University, Pittsburgh, PA, USA.; Stoica VA; Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA, USA.; Gonçalves MAP; Materials Research and Technology Department, Luxembourg Institute of Science and Technology (LIST), Esch/Alzette, Luxemburg.; Departamento de Ciencias de la Tierra y Física de la Materia Condensada, Universidad de Cantabria, Cantabria Campus Internacional, Santander, Spain.; Physics and Materials Science Research Unit, University of Luxembourg, Belvaux, Luxembourg.; Shao YT; School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA.; Parsonnet E; Department of Physics, University of California, Berkeley, CA, USA.; Marksz EJ; National Institute of Standards and Technology, Boulder, CO, USA.; Saremi S; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.; McCarter MR; Department of Physics, University of California, Berkeley, CA, USA.; Reynoso A; Department of Physics, University of California, Berkeley, CA, USA.; Long CJ; National Institute of Standards and Technology, Boulder, CO, USA.; Hagerstrom AM; National Institute of Standards and Technology, Boulder, CO, USA.; Meyers D; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.; Ravi V; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.; Prasad B; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.; Zhou H; Advanced Photon Source, Argonne National Laboratory, Argonne, IL, USA.; Zhang Z; Advanced Photon Source, Argonne National Laboratory, Argonne, IL, USA.; Wen H; Advanced Photon Source, Argonne National Laboratory, Argonne, IL, USA.; Gómez-Ortiz F; Departamento de Ciencias de la Tierra y Física de la Materia Condensada, Universidad de Cantabria, Cantabria Campus Internacional, Santander, Spain.; García-Fernández P; Departamento de Ciencias de la Tierra y Física de la Materia Condensada, Universidad de Cantabria, Cantabria Campus Internacional, Santander, Spain.; Bokor J; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.; Íñiguez J; Materials Research and Technology Department, Luxembourg Institute of Science and Technology (LIST), Esch/Alzette, Luxemburg.; Physics and Materials Science Research Unit, University of Luxembourg, Belvaux, Luxembourg.; Freeland JW; Advanced Photon Source, Argonne National Laboratory, Argonne, IL, USA.; Orloff ND; National Institute of Standards and Technology, Boulder, CO, USA.; Junquera J; Departamento de Ciencias de la Tierra y Física de la Materia Condensada, Universidad de Cantabria, Cantabria Campus Internacional, Santander, Spain.; Chen LQ; Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA, USA.; Salahuddin S; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.; Muller DA; School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA.; Kavli Institute at Cornell for Nanoscale Science, Ithaca, NY, USA.; Martin LW; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.; Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.; Ramesh R; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA. rramesh@berkeley.edu.; Department of Physics, University of California, Berkeley, CA, USA. rramesh@berkeley.edu.; Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, USA. rramesh@berkeley.edu.

Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101155473 Publication Model: Print Cited Medium: Internet ISSN: 1476-4660 (Electronic) Linking ISSN: 14761122 NLM ISO Abbreviation: Nat Mater Subsets: PubMed not MEDLINE; MEDLINE

Das S; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA. sujitdas@berkeley.edu.; Department of Physics, University of California, Berkeley, CA, USA. sujitdas@berkeley.edu.; Hong Z; Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA, USA.; Department of Mechanical Engineering, Carnegie Mellon University, Pittsburgh, PA, USA.; Stoica VA; Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA, USA.; Gonçalves MAP; Materials Research and Technology Department, Luxembourg Institute of Science and Technology (LIST), Esch/Alzette, Luxemburg.; Departamento de Ciencias de la Tierra y Física de la Materia Condensada, Universidad de Cantabria, Cantabria Campus Internacional, Santander, Spain.; Physics and Materials Science Research Unit, University of Luxembourg, Belvaux, Luxembourg.; Shao YT; School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA.; Parsonnet E; Department of Physics, University of California, Berkeley, CA, USA.; Marksz EJ; National Institute of Standards and Technology, Boulder, CO, USA.; Saremi S; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.; McCarter MR; Department of Physics, University of California, Berkeley, CA, USA.; Reynoso A; Department of Physics, University of California, Berkeley, CA, USA.; Long CJ; National Institute of Standards and Technology, Boulder, CO, USA.; Hagerstrom AM; National Institute of Standards and Technology, Boulder, CO, USA.; Meyers D; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.; Ravi V; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.; Prasad B; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.; Zhou H; Advanced Photon Source, Argonne National Laboratory, Argonne, IL, USA.; Zhang Z; Advanced Photon Source, Argonne National Laboratory, Argonne, IL, USA.; Wen H; Advanced Photon Source, Argonne National Laboratory, Argonne, IL, USA.; Gómez-Ortiz F; Departamento de Ciencias de la Tierra y Física de la Materia Condensada, Universidad de Cantabria, Cantabria Campus Internacional, Santander, Spain.; García-Fernández P; Departamento de Ciencias de la Tierra y Física de la Materia Condensada, Universidad de Cantabria, Cantabria Campus Internacional, Santander, Spain.; Bokor J; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.; Íñiguez J; Materials Research and Technology Department, Luxembourg Institute of Science and Technology (LIST), Esch/Alzette, Luxemburg.; Physics and Materials Science Research Unit, University of Luxembourg, Belvaux, Luxembourg.; Freeland JW; Advanced Photon Source, Argonne National Laboratory, Argonne, IL, USA.; Orloff ND; National Institute of Standards and Technology, Boulder, CO, USA.; Junquera J; Departamento de Ciencias de la Tierra y Física de la Materia Condensada, Universidad de Cantabria, Cantabria Campus Internacional, Santander, Spain.; Chen LQ; Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA, USA.; Salahuddin S; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.; Muller DA; School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA.; Kavli Institute at Cornell for Nanoscale Science, Ithaca, NY, USA.; Martin LW; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.; Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.; Ramesh R; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA. rramesh@berkeley.edu.; Department of Physics, University of California, Berkeley, CA, USA. rramesh@berkeley.edu.; Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, USA. rramesh@berkeley.edu.

Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101155473 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1476-4660 (Electronic) Linking ISSN: 14761122 NLM ISO Abbreviation: Nat Mater Subsets: PubMed not MEDLINE; MEDLINE

Lee CH; 1] Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA [2] Department of Materials Science and Engineering, Pennsylvania State University, University Park, Pennsylvania 16802, USA [3].; Orloff ND; Birol T; Zhu Y; Goian V; Rocas E; Haislmaier R; Vlahos E; Mundy JA; Kourkoutis LF; Nie Y; Biegalski MD; Zhang J; Bernhagen M; Benedek NA; Kim Y; Brock JD; Uecker R; Xi XX; Gopalan V; Nuzhnyy D; Kamba S; Muller DA; Takeuchi I; Booth JC; Fennie CJ; Schlom DG

Publisher: Nature Publishing Group Country of Publication: England NLM ID: 0410462 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1476-4687 (Electronic) Linking ISSN: 00280836 NLM ISO Abbreviation: Nature Subsets: PubMed not MEDLINE

Dawley NM; Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA.; Marksz EJ; Department of Materials Science and Engineering, University of Maryland, College Park, MD, USA.; National Institute of Standards and Technology, Boulder, CO, USA.; Hagerstrom AM; National Institute of Standards and Technology, Boulder, CO, USA.; Olsen GH; School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA.; Holtz ME; Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA.; School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA.; Goian V; Institute of Physics ASCR, Prague, Czech Republic.; Kadlec C; Institute of Physics ASCR, Prague, Czech Republic.; Zhang J; Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA.; Lu X; National Institute of Standards and Technology, Boulder, CO, USA.; Drisko JA; National Institute of Standards and Technology, Boulder, CO, USA.; Uecker R; Leibniz-Institut für Kristallzüchtung, Berlin, Germany.; Ganschow S; Leibniz-Institut für Kristallzüchtung, Berlin, Germany.; Long CJ; National Institute of Standards and Technology, Boulder, CO, USA.; Booth JC; National Institute of Standards and Technology, Boulder, CO, USA.; Kamba S; Institute of Physics ASCR, Prague, Czech Republic.; Fennie CJ; School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA.; Muller DA; School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA.; Orloff ND; National Institute of Standards and Technology, Boulder, CO, USA.; Schlom DG; Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA. schlom@cornell.edu.; Kavli Institute at Cornell for Nanoscale Science, Ithaca, NY, USA. schlom@cornell.edu.

Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101155473 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1476-4660 (Electronic) Linking ISSN: 14761122 NLM ISO Abbreviation: Nat Mater Subsets: PubMed not MEDLINE; MEDLINE

Hagerstrom AM; Communications Technology Laboratory (CTL), National Institute of Standards and Technology (NIST), 325 Broadway, Boulder, Colorado 80305, USA.; Department of Physics, University of Colorado, Boulder, Colorado 80309, USA.; Marksz EJ; Communications Technology Laboratory (CTL), National Institute of Standards and Technology (NIST), 325 Broadway, Boulder, Colorado 80305, USA.; Department of Materials Science and Engineering, University of Maryland, College Park, Maryland 20742, USA.; Zhang X; Department of Materials Science and Engineering, University of Maryland, College Park, Maryland 20742, USA.; Lu X; Communications Technology Laboratory (CTL), National Institute of Standards and Technology (NIST), 325 Broadway, Boulder, Colorado 80305, USA.; Department of Physics, University of Colorado, Boulder, Colorado 80309, USA.; Long CJ; Communications Technology Laboratory (CTL), National Institute of Standards and Technology (NIST), 325 Broadway, Boulder, Colorado 80305, USA.; Booth JC; Communications Technology Laboratory (CTL), National Institute of Standards and Technology (NIST), 325 Broadway, Boulder, Colorado 80305, USA.; Takeuchi I; Department of Materials Science and Engineering, University of Maryland, College Park, Maryland 20742, USA.; Orloff ND; Communications Technology Laboratory (CTL), National Institute of Standards and Technology (NIST), 325 Broadway, Boulder, Colorado 80305, USA.

Publisher: American Physical Society Country of Publication: United States NLM ID: 101633995 Publication Model: Print Cited Medium: Print ISSN: 2331-7019 (Print) Linking ISSN: 23317019 NLM ISO Abbreviation: Phys Rev Appl Subsets: PubMed not MEDLINE

Little CAE; Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309, USA.; Orloff ND; Hanemann IE; Long CJ; Bright VM; Booth JC

Publisher: Royal Society of Chemistry Country of Publication: England NLM ID: 101128948 Publication Model: Print Cited Medium: Internet ISSN: 1473-0189 (Electronic) Linking ISSN: 14730189 NLM ISO Abbreviation: Lab Chip Subsets: PubMed not MEDLINE

Grundy, SM; Becker, D; Clark, LT; Cooper, RS; Denke, MA; Howard, WJ; Hunninghake, DB; Illingworth, R; Luepker, RV; McBride, P; McKenney, JM; Pasternak, RC; Stone, NJ; Van Horn, L; Brewer, HB; Cleeman, JI; Ernst, ND; Gordon, D; Levy, D; Rifkind, B; Rossouw, JE; Savage, P; Haffner, SM; Orloff, DG; Proschan, MA; Schwartz, JS; Sempos, CT; Shero, ST; Murray, EZ; Keller, SA; Jehle, AJ; Natl Cholesterol Educ Program Expert

CIRCULATION; DEC 17 2002, 106 25, p3143-p3421, 279p.

Cleeman, JI; Grundy, SM; Becker, D; Clark, LT; Cooper, RS; Denke, MA; Howard, WJ; Hunninghake, DB; Illingworth, DR; Luepker, RV; McBride, P; McKenney, JM; Pasternak, RC; Stone, NJ; Van Horn, L; Brewer, HB; Ernst, ND; Gordon, D; Levy, D; Rifkind, B; Rossouw, JE; Savage, P; Haffner, SM; Orloff, DG; Proschan, MA; Schwartz, JS; Sempos, CT; Shero, ST; Murray, EZ; Natl Cholesterol Educ Program Expe

JAMA-JOURNAL OF THE AMERICAN MEDICAL ASSOCIATION; MAY 16 2001, 285 19, p2486-p2497, 12p.

Long CJ; Orloff ND; Twedt KA; Lam T; Vargas-Lara F; Zhao M; Natarajan B; Scott KC; Marksz E; Department of Mechanical Engineering & Materials Science, University of Pittsburgh , Pittsburgh, Pennsylvania 15260, United States.; Nguyen T; Douglas JF; McClelland J; Garboczi E; Obrzut J; Liddle JA

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: PubMed not MEDLINE