학술논문
'학술논문'
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Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning
Academic Journal
van Veldhoven, J.; Stodolna, A.S.; Storm, A.; van den Brink, J.; Geerits, N.; Vlaar, J.; Dekker, M.; Ushakov, A.
IEEE Transactions on Plasma Science IEEE Trans. Plasma Sci. Plasma Science, IEEE Transactions on. 49(10):3132-3141 Oct, 2021
Academic Journal
Kurilovich, D.; Pinto, T.D.F.; Torretti, F.; Schupp, R.; Scheers, J.; Stodolna, A.S.; Eikema, K.S.E.; Witte, S.; Ubachs, W.; Hoekstra, R.; Versolato, O.O.; Gelderblom, H.
In: Physical Review Applied . (Physical Review Applied, 2 November 2018, 10(5))
Academic Journal
Stodolna, A.S.; De Faria Pinto, T.; Ali, F.; Bayerle, A.; Kurilovich, D.; Mathijssen, J.; Hoekstra, R.; Versolato, O.O.; Eikema, K.S.E.; Witte, S.
In: Journal of Applied Physics . (Journal of Applied Physics, 7 August 2018, 124(5))
Academic Journal
Stodolna, A.S.; Gijsbertsen, A.; Jungmann-Smith, J.H.; Vrakking, M.J.J.; Lépine, F.; Bordas, C.; Rouzée, A.; Cohen, S.
In: Journal of Physics B: Atomic, Molecular and Optical Physics . (Journal of Physics B: Atomic, Molecular and Optical Physics, 20 July 2017, 50(16))
Academic Journal
In: Optics Letters . (Optics Letters, 15 July 2017, 42(14):2758-2761)
Academic Journal
Deuzeman, M.J.; Stodolna, A.S.; Leerssen, E.E.B.; Antoncecchi, A.; Spook, N.; Kleijntjens, T.; Witte, S.; Eikema, K.S.E.; Ubachs, W.; Hoekstra, R.; Versolato, O.O.; Versluis, J.
In: Journal of Applied Physics . (Journal of Applied Physics, 14 March 2017, 121(10))
Academic Journal
Stodolna, A.S.; Gijsbertsen, A.; Jungmann, J.H.; Vrakking, M.J.J.; Lépine, F.; Bordas, C.; Bergeman, T.; Robicheaux, F.
In: Physical Review Letters . (Physical Review Letters, 4 September 2014, 113(10))
Academic Journal
Stodolna, A.S.; Rouzée, A.; Gijsbertsen, A.; Jungmann, J.H.; Vrakking, M.J.J.; Lépine, F.; Bordas, C.; Cohen, S.; Robicheaux, F.
In: Physical Review Letters . (Physical Review Letters, 20 May 2013, 110(21))
Academic Journal
Huismans, Y.; Rouzée, A.; Gijsbertsen, A.; Logman, P.S.W.M.; Stodolna, A.S.; Jungmann, J.H.; Vrakking, M.J.J.; Lépine, F.; Cauchy, C.; Zamith, S.; Bakker, J.M.; Berden, G.; Redlich, B.; Van Der Meer, A.F.G.; Schafer, K.J.
In: Physical Review A - Atomic, Molecular, and Optical Physics . (Physical Review A - Atomic, Molecular, and Optical Physics, 19 March 2013, 87(3))
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[AR] Stodolna, A.S.
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