학술논문
'학술논문'
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1~10
Academic Journal
Beker, M.; Bobbink, G.; Deelen, N.; Duinker, P.; Eldik, J.V.; Fortman, N.D.G.; Geer, R.V.D.; Graaf, H.V.D.; Groenstege, H.; Hart, R.; Hashemi, K.; Heijningen, J.V.; Kea, M.; Koopstra, J.; Leijtens, X.; Linde, F.; Tolsma, H.; Woudstra, M.; Bouwens, B.; Paradiso, J.A.
In: Journal of Instrumentation . (Journal of Instrumentation, 8 August 2019, 14(8))
Conference
He, W.; Xu, C.; Bae, D.; Chen, K.; Lan, A.; Yang, R.; Elmalk, A.; Jiang, A.; Wang, F.; Chung, D.; Su, S.; Pao, K.-F.; Patterson, O.D.; Raghunathan, S.; Kea, M.; Liao, J.
In: Proceedings of SPIE - The International Society for Optical Engineering , Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV. (Proceedings of SPIE - The International Society for Optical Engineering, 2021, 11611)
Conference
Jeong, J.; Lee, J.; Kim, J.; Yea, S.; Hwang, C.; Lee, S.Y.; Lee, J.; Park, J.; Nikolsky, P.; Park, D.; Corradi, A.; Yu, H.-W.; Jung, S.-W.; Ovchinnikov, D.; Timoshkov, V.; De La Fuente Valentin, I.; Yin, Y.; Padhye, K.; Tel, W.; Dillen, H.; Thuijs, K.; Slotboom, D.; Wang, M.; Su, R.; Kea, M.; Lee, J.-W.; Sung, Y.-A.; Kim, S.-U.; Song, Y.-H.; Lee, J.; Kwon, O.-S.
In: Proceedings of SPIE - The International Society for Optical Engineering , Metrology, Inspection, and Process Control for Microlithography XXXIV. (Proceedings of SPIE - The International Society for Optical Engineering, 2020, 11325)
Conference
Dillen, H.; Chang, Y.-H.; Wang, F.; Kea, M.; Rispens, G.; Kooiman, M.; Wang, F.; Hunsche, S.; Tien, D.; Tang, P.; Zhang, P.
In: Proceedings of SPIE - The International Society for Optical Engineering , International Conference on Extreme Ultraviolet Lithography 2018. (Proceedings of SPIE - The International Society for Optical Engineering, 2018, 10809)
Conference
In: Proceedings of SPIE - The International Society for Optical Engineering , Metrology, Inspection, and Process Control for Microlithography XXX. (Proceedings of SPIE - The International Society for Optical Engineering, 2016, 9778)
Conference
Verstappen, L.; Mos, E.; Wardenier, P.; Megens, H.; Schmitt-Weaver, E.; Bhattacharyya, K.; Adam, O.; Grzela, G.; Van Heijst, J.; Willems, L.; Wildenberg, J.; Ignatova, V.; Chen, A.; Elich, F.; Rajasekharan, B.; Vergaij-Huizer, L.; Lewis, B.; Kea, M.; Mulkens, J.
In: Proceedings of SPIE - The International Society for Optical Engineering , Metrology, Inspection, and Process Control for Microlithography XXX. (Proceedings of SPIE - The International Society for Optical Engineering, 2016, 9778)
Conference
In: Proceedings of SPIE - The International Society for Optical Engineering , Metrology, Inspection, and Process Control for Microlithography XXX. (Proceedings of SPIE - The International Society for Optical Engineering, 2016, 9778)
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[AR] Kea, M.
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