부산대학교 도서관

Different kinds of gas discharges are being used for large volume steady state plasma generation. They are various glow, radio frequency, microwave, and others. PIII and D technology requires creation of dense (of order 10{sup 10}--10{sup 11} cm{sup {minus}3}) uniform plasma of up to several m{sup 3} in volume providing high energy and gas efficiency, reliability in a presence of reactive gases and/or high metal ion/atom fluxes. To meet collisionless sheath and proper surface treatment environment conditions low-pressure plasma is preferable. Comparative analysis of plasma parameters and performance for hot cathode DC and inductively coupled 13.56 MHz RF discharges has been carried out. Both discharges were sustained in the same 18-liter cylindrical processing chamber of the self developed 30 kV experimental PIII and D facility. High emission impregnated cathodes had been used in case of dc discharge. Inductive coupling for RF discharge had been provided using an internal two-half-turn antenna, coated with Al{sub 2}O{sub 3}. Different operating modes were tested including in situ sputter deposition with simultaneous implantation. Effects of degradation of cathode emission due to coating and contamination of deposited films with cathode impregnated materials and antenna coating have been analyzed. Results are being used in design of 120 kV, 1m{sup 3} PIII and D facility which is under developing now.