학술논문
Nucleation site location and its influence on the microstructure of solid-phase crystallized SiGe films
Document Type
Academic Journal
Author
Source
Journal of Applied Physics. Sept 1, 2001, Vol. 90 Issue 5, p2544, 9 p.
Subject
Language
ISSN
0021-8979
Abstract
Research describing the microstructure of amorphous silicon-germanium films is presented. In particular the solid phase crystallization kinetics of films of different compositions is investigated.