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Effect of the number and distribution of Al2O3 atomic layer deposition cycles within HfO2 layer on ferroelectric characteristics

Document Type

Article

Author

Park, H.; Jeong, J.; Kim, H.W.; Hong, E.; Kim, N.; Jeon, S.; Kim, Y.; Choi, H.; Woo, J.

Source

In: Applied Physics Letters. (Applied Physics Letters, 25 March 2024, 124(13))

Subject

Language

English

ISSN

00036951

Online Access

Full Text (AIP) Web of Science JCR 저널정보 Scopus Find it@PNU

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