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Tailoring potentials by simulation-aided design of gate layouts for spin-qubit applications

Document Type

Article

Author

Seidler, I.; Neul, M.; Kammerloher, E.; Künne, M.; Bluhm, H.; Schreiber, L.R.; Schmidbauer, A.; Diebel, L.K.; Bougeard, D.; Ludwig, A.; Ritzmann, J.; Wieck, A.D.

Source

In: Physical Review Applied. (Physical Review Applied, October 2023, 20(4))

Subject

Language

English

ISSN

23317019

Online Access

Full Text (ECC - 개별구독 전자저널) Web of Science JCR 저널정보 Scopus Find it@PNU

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