학술논문
Accurate mask model implementation in optical proximity correction model for 14-nm nodes and beyond
Document Type
Article
Author
Source
In: Journal of Micro/ Nanolithography, MEMS, and MOEMS . (Journal of Micro/ Nanolithography, MEMS, and MOEMS, 1 April 2016, 15(2))
Subject
Language
English
ISSN
19325134
19325150
19325150