부산대학교 도서관

Deep Learning approaches have revolutionized in the past decade the field of Computer Vision and, as a consequence, they are having a major impact in Industry 4.0 applications like automatic defect classification. Nevertheless, additional data, beside the image/video itself, is typically never exploited in a defect classification module: this aspect, given the abundance of data in data-intensive manufacturing environments (like semiconductor manufacturing) represents a missed opportunity. In this work we present a use case related to Scanning Electron Microscope (SEM) images where we exploit a Bayesian approach to improve defect classification. We validate our approach on a real-world case study and by employing modern Deep Learning architectures for classification.