학술논문

AI Solution for Metrology Recipe Automation
Document Type
Conference
Source
2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) Advanced Semiconductor Manufacturing Conference (ASMC), 2021 32nd Annual SEMI. :1-4 May, 2021
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Semiconductor device measurement
Coordinate measuring machines
Automation
Systematics
Monte Carlo methods
Semiconductor device reliability
Metrology
Metrology Recipe Automation
wafer less recipe
wafer map sampling
measurement sites auto grouping
Language
ISSN
2376-6697
Abstract
The proposed paper presents the use of Artificial Intelligence (AI) as a solution to perform wafer map sampling and measurement points’ coordinates extraction for Metrology recipe automation in a wafer fab. This solution greatly improves fab operation efficiency and reliability by reducing engineering time while also providing systematic data for downstream analyses. In this paper we use AI solution to solve the