학술논문
Measurement of linewidth and line edge roughness for 1D nano CD linewidth standard product lines
Document Type
Conference
Author
Source
2007 7th IEEE Conference on Nanotechnology (IEEE NANO) Nanotechnology, 2007. IEEE-NANO 2007. 7th IEEE Conference on. :769-772 Aug, 2007
Subject
Language
ISSN
1944-9399
Abstract
One-dimensional nano CD (NCD) linewidth standard product lines are prepared using multilayer thin films deposition technique. The Ti/SiO2 multilayer thin films are systematically deposited on silicon substrates in the conventional electron-beam evaporation system. Then a single nanometer scale line can be obtained on the cleaved cross-section of one multilayer thin films structure. The linewidth and line edge roughness (LER) have been evaluated by analyzing top-down scanning electron microscope (SEM) images off-line using image processing techniques. The average linewidth is less than 25 nm and LER is estimated.