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Progress on collisionally pumped optical-field-ionization soft X-ray lasers
Document Type
Periodical
Author
Sebban, S.; Mocek, T.; Bettaibi, I.; Cros, B.; Maynard, G.; Butler, A.; Gonzalves, A.J.; McKenna, C.M.; Spence, D.J.; Hooker, S.M.; Upcraft, L.M.; Breger, P.; Agostini, P.; le Pape, S.; Zeitoun, P.; Valentin, C.; Balcou, P.; Ros, D.; Kazamias, S.; Klisnick, A.; Jamelot, G.; Rus, B.; Wyart, J.F.
Source
IEEE Journal of Selected Topics in Quantum Electronics IEEE J. Select. Topics Quantum Electron. Selected Topics in Quantum Electronics, IEEE Journal of. 10(6):1351-1362 Jan, 2004
Subject
Engineered Materials, Dielectrics and Plasmas
Photonics and Electrooptics
X-ray lasers
Laser excitation
Optical pumping
Pump lasers
Gas lasers
Laser theory
Stimulated emission
Ionization
Optical polarization
Xenon
High-intensity laser
laser plasma
optical field ionization (OFI)
X-ray laser (XRL)
Language
ISSN
1077-260X
1558-4542
Abstract
We present the status of optical field ionization soft X-ray lasers. The amplifying medium is generated by focusing a high-energy circularly polarized 30-fs 10-Hz Ti: sapphire laser system in a gaseous medium. Using xenon or krypton, strong laser emission at 41.8 and 32.8 nm, respectively, has been observed. After presenting the basis of the physics, we present recent characterization of the sources as well as dramatic improvement of their performances using the waveguiding technique.

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