학술논문

Pulsed ion beam evaporation at low temperature for the preparation of thin films
Document Type
Conference
Source
Conference Record of the Twenty-Fifth International Power Modulator Symposium, 2002 and 2002 High-Voltage Workshop. Power modulator symposium and high-voltage workshop Power Modulator Symposium, 2002 and 2002 High-Voltage Workshop. Conference Record of the Twenty-Fifth International. :540-543 2002
Subject
Power, Energy and Industry Applications
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Robotics and Control Systems
Ion beams
Transistors
Plasma temperature
Substrates
Semiconductor films
Semiconductor thin films
Silicon
Dielectric thin films
Solids
Chemical vapor deposition
Language
ISSN
1076-8467
Abstract
Using high-density ablation plasma produced by pulsed ion beam interaction with solid targets, it has been demonstrated by the present authors to prepare thin films at low temperature, which was called ion beam evaporation. In addition to the first preparation of ZnS in 1988, the preparation of many films has been succeeded such as YBCO, (SrBa)TiO/sub 3/, SrAl/sub 2/O/sub 4/:Eu, poly-Si, ITO, and apatite. Since some of them have been already reported elsewhere, some other new results of the preparation of thin films by IBE are presented such as Si-Ge or HfO/sub 2/.