학술논문

Monolithically Integrated 940 nm Half VCSELs on Bulk Ge Substrates
Document Type
Periodical
Source
IEEE Photonics Technology Letters IEEE Photon. Technol. Lett. Photonics Technology Letters, IEEE. 36(3):203-206 Feb, 2024
Subject
Engineered Materials, Dielectrics and Plasmas
Photonics and Electrooptics
Vertical cavity surface emitting lasers
Germanium
Gallium arsenide
Substrates
Quantum well devices
Reflectivity
Distributed Bragg reflectors
Distributed Bragg reflector (DBR)
growth quality
optical performance
reflectance
stopband
vertical cavity surface emitting laser (VCSEL)
Language
ISSN
1041-1135
1941-0174
Abstract
High-quality n-type AlGaAs distributed Bragg reflectors (DBRs) and lnGaAs multiple quantum wells (MQWs) were successfully monolithically grown on 4-inch off-cut Ge (100) wafers. Even without any design and process optimization for the Ge substrates, the Ge-based half VCSELs have photoluminescence and reflectance spectra comparable to those grown on conventional GaAs wafers. Flat and sub-nm RMS surface roughness and uniform DBR and MQW growth across the wafer were achieved. These results strongly support full VCSEL growth and fabrication on larger-area Ge wafers for the mass production of AlGaAs-based VCSELs.