학술논문

Bypass Resistive RAM With Interface Switching-Based Resistive RAM and InGaZnO Bypass Transistor for V-NAND Applications
Document Type
Periodical
Source
IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 45(2):192-195 Feb, 2024
Subject
Engineered Materials, Dielectrics and Plasmas
Components, Circuits, Devices and Systems
Phase change random access memory
Logic gates
Transistors
Switches
Electrolytes
Switching circuits
Resistance
Resistive random-access memory
V-NAND
interface type RRAM
selector
bypass RRAM
Language
ISSN
0741-3106
1558-0563
Abstract
We report a bypass resistive random-access memory (B-RRAM), which combines interface switching-based RRAM and an IGZO transistor, providing high compatibility with a vertical NAND (V-NAND) structure for high-density memory. The analog switching properties of the WOx resistive switching (RS) layer for the memory and the low off-state leakage current of the IGZO transistor (Tr) were utilized for the selector device. By utilizing the bypass reading between the RS and Tr layer, B-RRAM exhibits the favorable memory characteristics with a low operation voltage (~ 2 V), outstanding multibit operation (> 3 bits), and robust endurance ( $\sim ~10^{{6}}{)}$ . Furthermore, the B-RRAM also demonstrated a high on/off ( $ > 10^{{6}}{)}$ ratio and reasonable retention characteristics owing to the synergistic effects of RS and Tr layers. These results suggest that the B-RRAM has promising potential as a replacement for V-NAND flash memory.