학술논문

A Surface Potential Based Full-Region Current Model for Doping Segregated TFETs
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 71(1):46-53 Jan, 2024
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Electric potential
TFETs
Tunneling
Logic gates
Semiconductor process modeling
Integrated circuit modeling
Silicon
CMOS-TFET logic
compact model
tunneling field-effect transistors (TFETs)
Language
ISSN
0018-9383
1557-9646
Abstract
A physics-based SPICE model for dopant segregated tunneling field-effect transistors (DS-TFETs) with gate-to-drain underlap is developed for the design technology co-optimization (DTCO) of TFETs with the foundry process. It captures all the current components in full operation regions, including band-to-band tunneling (BTBT), forward p-i-n diode, gate leakage, and also ambipolar conduction. The channel surface potential is formulated first, with which the current expressions are derived and verified with experiments calibrated TCAD simulations. Model predictions of current, conductance, and voltage transfer characteristic (VTC) are in good agreement with measurement data of hardware devices (nTFET and pTFET) as well as circuits. This model has been written in Verilog-A language and employed in the TFET circuits design.