학술논문

Novel Operation Scheme for Suppressing Disturb in HfO2-based FeFET Considering Charge- Trapping-Coupled Polarization Dynamics
Document Type
Conference
Source
2023 IEEE International Reliability Physics Symposium (IRPS) Reliability Physics Symposium (IRPS), 2023 IEEE International. :1-5 Mar, 2023
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Engineering Profession
Voltage
Hafnium compounds
Reliability
Transient analysis
FeFETs
Stress
Physics
FeFET
memory
polarization
charge-trap
disturb
Language
ISSN
1938-1891
Abstract
We successfully demonstrate a significant suppression of the $V_{th}$ shift caused by the program/erase disturb in HfO 2 -based ferroelectric FET (FeFET) using a novel operation scheme. Polarization reversal is found to occur after volatile carrier trapping at the HfO 2 /SiO 2 interface. Dividing the disturb stress in to a train of short voltage pulses with intentional long intervals decouples the carrier trapping from the polarization reversal. Consequently, the immunity to disturbance is improved by more than four orders of magnitude. We model the disturb suppression mechanism as follows: insufficient interfacial charge trapping unstabilizes the reversed polarization to keep the domain undisturbed. Our findings show a promising guideline for improving the reliability of the FeFET array operation.