학술논문
Effect of 2-phosphonobutane-1,2,4-tricarboxylic acid (PBTCA) on Cu/Ta chemical mechanical planarization (CMP) in the barrier layer: A novel complexing agent and the dual role on Cu
Document Type
Article
Author
Source
In Surfaces and Interfaces March 2024 46
Subject
Language
ISSN
2468-0230