학술논문
Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M = Mo, W) as precursors
Document Type
Article
Author
Source
In Surface & Coatings Technology 15 September 2013 230:130-136
Subject
Language
ISSN
0257-8972