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Modulation of the effective work function of fully-silicided (FUSI) gate stacks

Document Type

Article

Author

Kittl, J.A.; Lauwers, A.; Pawlak, M.A.; Veloso, A.; Yu, H.Y.; Chang, S.Z.; Hoffmann, T.; Pourtois, G.; Brus, S.; Demeurisse, C.; Vrancken, C.; Absil, P.P.; Biesemans, S.

Source

In Microelectronic Engineering 2007 84(9):1857-1860

Subject

Language

ISSN

0167-9317

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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