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Polishing mechanism of tantalum films by SiO 2 particles

Document Type

Article

Author

Vijayakumar, A; Du, T; Sundaram, K.B ; Desai, V

Source

In Microelectronic Engineering 2003 70(1):93-101

Subject

Language

ISSN

0167-9317

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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