학술논문
Self-Aligned Nanopatterning and Controlled Lateral Growth by Dual-Material Orthogonal Area-Selective Deposition of Poly(3,4-ethylenedioxythiophene) and Tungsten.
Document Type
Article
Source
Chemistry of Materials; 6/13/2023, Vol. 35 Issue 11, p4375-4384, 10p
Subject
Language
ISSN
08974756