학술논문

Structural properties of ZnO:Al films produced by the sol-gel technique.
Document Type
Article
Source
Semiconductors. Oct2015, Vol. 49 Issue 10, p1253-1258. 6p.
Subject
*ZINC oxide films
*CRYSTAL structure
*ALUMINUM films
*SOL-gel processes
*X-ray diffraction
*TEMPERATURE effect
*ATOMIC force microscopy
Language
ISSN
1063-7826
Abstract
ZnO:Al films are produced by sol-gel deposition at temperatures of 350-550°C, using different types of reagents. Atomic-force microscopy, X-ray diffraction analysis, Raman spectroscopy, and optical transmittance measurements are used to study the dependence of the structural, morphological, and optical properties of the ZnO:Al coatings on the conditions of deposition. The optical conditions for the production of ZnO:Al layers with preferred orientation in the [001] direction and distinguished by small surface roughness are established. The layers produced in the study possess optical transmittance at a level of up to 95% in a wide spectral range and can be used in optoelectronic devices. [ABSTRACT FROM AUTHOR]