학술논문

A study of structural and mechanical properties of nano-crystalline tungsten nitride film synthesis by plasma focus.
Document Type
Article
Source
Radiation Effects & Defects in Solids: Incorporating Plasma Techniques & Plasma Phenomena. Feb2015, Vol. 170 Issue 2, p73-83. 11p.
Subject
*NANOCRYSTALS
*NANOCRYSTAL synthesis
*NANOFILMS
*PLASMA focus
*METAL nitrides
*TUNGSTEN compounds
*X-ray diffraction measurement
Language
ISSN
1042-0150
Abstract
Nano-crystalline tungsten nitride thin films are synthesized on AISI-304 steel at room temperature using Mather-type plasma focus system. The surface properties of the exposed substrate against different deposition shots are examined for crystal structure, surface morphology and mechanical properties using X-ray diffraction (XRD), atomic force microscope, field emission scanning electron microscope and nano-indenter. The XRD results show the growth of WN and WN2 phases and the development of strain/stress in the deposited films by varying the number of deposition shots. Morphology of deposited films shows the significant change in the surface structure with different ion energy doses (number of deposition shots). Due to the effect of different ion energy doses, the strain/stress developed in the deposited film leads to an improvement of hardness of deposited films. [ABSTRACT FROM AUTHOR]