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발행년	- (예 : 2010-2015)

Development of SSQ based 157 nm photoresist[1]

Academic Journal

Hung, R.J.; Yamachika, M.; Iwasawa, H.; Hayashi, A.; Yamahara, N.; Shimokawa, Tsutomu

In: Journal of Photopolymer Science and Technology. (Journal of Photopolymer Science and Technology, 2002, 15(4):693-698)

Open Access (JSTAGE) Web of Science JCR 저널정보 Scopus Find it@PNU

Scaa mask exposures and phase phirst design for 110 nm and below

Academic Journal

Levenson, M.D.; Ebihara, T.; Yamachika, M.

In: Proceedings of SPIE - The International Society for Optical Engineering. (Proceedings of SPIE - The International Society for Optical Engineering, 2001, 4346(1):817-826)

Scopus Find it@PNU

157 nm resist materials: A progress report

Academic Journal

Chiba, T.; Hung, R.J.; Yamada, S.; Trinque, B.; Yamachika, M.; Brodsky, C.; Patterson, K.; Heyden, A.V.; Jamison, A.; Lin, S.-H.; Somervell, M.; Grant Willson, C.; Byers, J.; Conley, W.

In: Journal of Photopolymer Science and Technology. (Journal of Photopolymer Science and Technology, 2000, 13(4):657-664)

Open Access (JSTAGE) Web of Science JCR 저널정보 Scopus Find it@PNU

Improvement of post-exposure delay stability in alicyclic ArF excimer photoresists

Academic Journal

Yamachika, M.; Patterson, K.; Cho, S.; Rager, T.; Yamada, S.; Willson, C.G.; Byers, J.; Paniez, P.J.; Gally, S.; Sassoulas, P.-O.; Mortini, B.

In: Journal of Photopolymer Science and Technology. (Journal of Photopolymer Science and Technology, 1999, 12(4):553-560)

Open Access (JSTAGE) Web of Science JCR 저널정보 Scopus Find it@PNU

Positive Deep-UV Resist Based on Silylated Polyhydroxystyrene

Academic Journal

Murata, M.; Kobayashi, E.; Yamachika, M.; Kobayashi, Y.; Yumoto, Y.; Miura, T.

In: Journal of Photopolymer Science and Technology. (Journal of Photopolymer Science and Technology, 1992, 5(1):79-84)

Open Access (JSTAGE) Web of Science JCR 저널정보 Scopus Find it@PNU

Photocatalytic conversion of lactic acid to malic acid through pyruvic acid in the presence of malic enzyme and semiconductor photocatalysts

Academic Journal

Inoue, H.; Yamachika, M.; Yoneyama, H.

In: Journal of the Chemical Society, Faraday Transactions. (Journal of the Chemical Society, Faraday Transactions, 1992, 88(15):2215-2219)

Scopus Find it@PNU

Photochemical properties of PbS microcrystallites prepared in Nafion

Academic Journal

Miyoshi, H.; Yamachika, M.; Yoneyama, H.; Mori, H.

In: Journal of the Chemical Society, Faraday Transactions. (Journal of the Chemical Society, Faraday Transactions, 1990, 86(5):815-818)

Scopus Find it@PNU

Alkaline-developable positive resist based on silylated polyhydroxystyrene for KrF excimer laser lithography

Conference

Kobayashi, E.; Murata, M.; Yamachika, M.; Kobayashi, Y.; Yumoto, Y.; Miura, T.

In: Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering. (Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering, 1992, 66:47-48)

Scopus Find it@PNU

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