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발행년	- (예 : 2010-2015)

Characteristics of HfN Films Deposited by Using Remote Plasma-enhanced Atomic Layer Deposition

Academic Journal

전형탁; Wooho Jeong; Youngbin Ko; Seokhwan Bang; Seungjun Lee

Journal of the Korean Physical Society, 56(3), pp.905-910 Mar, 2010

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Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer

Academic Journal

Hyungseok Hong; 전형탁; Honggyu Kim; Hyungchul Kim; Sanghyun Woo; Seokhoon Kim; Seokhwan Bang; Seungjun Lee; Sunyeol Jeon; Wooho Jeong

Journal of the Korean Physical Society, 52(4), pp.1114-1119 Apr, 2008

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Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation

Academic Journal

Seokhoon Kim; 전형탁; Hyungchul Kim; Inhoe Kim; Keunwoo Lee; Sanghyun Woo; Taeyong Park; Wooho Jeong

Journal of the Korean Physical Society, 52(4), pp.1103-1108 Apr, 2008

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Structural and Electrical Properties of ZnO Thin Films Deposited by Atomic Layer Deposition at Low Temperatures.

Academic Journal

Sunyeol Jeon; Seokhwan Bang; Seungjun Lee; Semyung Kwon; Wooho Jeong; Hyeongtag Jeon; Ho Jung Chang; Hyung-Ho Park

Journal of The Electrochemical Society; 2008, Vol. 155 Issue 10, pH738-H743, 6p, 1 Black and White Photograph, 2 Charts, 18 Graphs

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Physical and Electrical Properties of Hafnium—Zirconium—Oxide Films Grown by Atomic Layer Deposition.

Academic Journal

Seokhwan Bang; Seungjun Lee; Sunyeol Jeon; Semyung Kwon; Wooho Jeong; Seokhoon Kim; Hyeongtag Jeon

Journal of The Electrochemical Society; 2008, Vol. 155 Issue 9, pH633-H637, 5p, 1 Chart, 7 Graphs

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Characteristics of Hafnium-Zirconium-Oxide Film Treated by Remote Plasma Nitridation.

Academic Journal

Seungjun Lee; Seokhwan Bang; Sunyeol Jeon; Semyung Kwon; Wooho Jeong; Seokhoon Kim; Hyeongtag Jeon

Journal of The Electrochemical Society; Jul2008, Vol. 155 Issue 7, pH516-H519, 4p, 6 Graphs

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Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures.

Academic Journal

Seokhoon Kim; Sanghyun Woo; Hyungchul Kim; Wooho Jeong; Taeyong Park; Honggyu Kim; Sung Bae Kim; Hyeongtag Jeon

Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Nov/Dec2007, Vol. 25 Issue 6, p1922-1927, 6p, 1 Diagram, 7 Graphs

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Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl.

Academic Journal

Keunjun Kim; Keunwoo Lee; Sejin Han; Wooho Jeong; Hyeongtag Jeon

Journal of The Electrochemical Society; Mar2007, Vol. 154 Issue 3, pH177-H181, 5p, 8 Graphs

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Investigation of the effects of interface carrier concentration on ZnO thin film transistors fabricated by atomic layer deposition.

Academic Journal

Seokhwan Bang; Seungjun Lee; Joohyun Park; Soyeon Park; Wooho Jeong; Hyeongtag Jeon

Journal of Physics D: Applied Physics. Dec2009, Vol. 42 Issue 23, p235102-235102. 1p.

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