학술논문
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Academic Journal
Juha, L. ; Bittner, M.; Chvostova, D.; Letal, V.; Krasa, J.; Otcenasek, Z.; Kozlova, M.; Polan, J.; Präg, A.R.; Rus, B.; Stupka, M.; Krzywinski, J.; Andrejczuk, A.; Pelka, J.B.; Sobierajski, R.; Ryc, L.; Feldhaus, J.; Boody, F.P.; Grisham, M.E.; Vaschenko, G.O.; Menoni, C.S.; Rocca, J.J.
In Journal of Electron Spectroscopy and Related Phenomena 2005 144:929-932
Academic Journal
Farrar, N.R.; Brandt, D.C.; Fomenkov, I.V.; Ershov, A.I.; Bowering, N.R.; Partlo, W.N.; Myers, D.W.; Bykanov, A.N.; Vaschenko, G.O.; Khodykin, O.V.; Hoffman, J.R.; Chrobak, C.P.
In: Microelectronic Engineering . (Microelectronic Engineering, April 2009, 86(4-6):509-512)
Academic Journal
Böwering, N.R.; Fomenkov, I.V.; Brandt, D.C.; Bykanov, A.N.; Ershov, A.I.; Partlo, W.N.; Myers, D.W.; Farrar, N.R.; Vaschenko, G.O.; Khodykin, O.V.; Hoffman, J.R.; Chrobak, C.P.; Srivastava, S.N.; Ahmad, I.; Rajyaguru, C.; Golich, D.; Vidusek, D.A.; De Dea, S.; Hou, R.R.
In: Journal of Micro/Nanolithography, MEMS, and MOEMS . (Journal of Micro/Nanolithography, MEMS, and MOEMS, 2009, 8(4))
Academic Journal
Juha, L.; Bittner, M.; Chvostová, D.; Krása, J.; Kozlová, M.; Pfeifer, M.; Polan, J.; Präg, A.R.; Rus, B.; Stupka, M.; Feldhaus, J.; Létal, V.; Otcenasek, Z.; Krzywinski, J.; Nietubyc, R.; Pelka, J.B.; Andrejczuk, A.; Sobierajski, R.; Ryc, L.; Boody, F.P.; Fiedorowicz, H.; Bartnik, A.; Mikolajczyk, J.; Rakowski, R.; Kubát, P.; Pína, L.; Horváth, M.; Grisham, M.E.; Vaschenko, G.O.; Menoni, C.S.; Rocca, J.J.
In: Journal of Microlithography, Microfabrication and Microsystems . (Journal of Microlithography, Microfabrication and Microsystems, July 2005, 4(3))
Conference
Fomenkov, I.V.; Purvis, M.A.; Schafgans, A.A.; Tao, Y.; Rokitski, S.; Stewart, J.; LaForge, A.; Ershov, A.I.; Rafac, R.J.; De Dea, S.; Rajyaguru, C.; Vaschenko, G.O.; Abraham, M.; Brandt, D.C.; Brown, D.J.
In: Proceedings of SPIE - The International Society for Optical Engineering , International Conference on Extreme Ultraviolet Lithography 2018. (Proceedings of SPIE - The International Society for Optical Engineering, 2018, 10809)
Conference
Brandt, D.C.; Fomenkov, I.V.; Farrar, N.R.; La Fontaine, B.; Myers, D.W.; Brown, D.J.; Ershov, A.I.; Sandstrom, R.L.; Vaschenko, G.O.; Böwering, N.R.; Das, P.; Fleurov, V.B.; Zhang, K.; Srivastava, S.N.; Ahmad, I.; Rajyaguru, C.; De Dea, S.; Dunstan, W.J.; Baumgart, P.; Ishihara, T.; Simmons, R.D.; Jacques, R.N.; Bergstedt, R.A.; Porshnev, P.I.; Wittak, C.J.; Rafac, R.J.; Grava, J.; Schafgans, A.A.; Tao, Y.; Hoffmann, K.; Ishikawa, T.; Evans, D.R.; Rich, S.D.
In: Proceedings of SPIE - The International Society for Optical Engineering , Extreme Ultraviolet (EUV) Lithography IV. (Proceedings of SPIE - The International Society for Optical Engineering, 2013, 8679)
Conference
Brandt, D.C.; Fomenkov, I.V.; Lercel, M.J.; La Fontaine, B.M.; Myers, D.W.; Brown, D.J.; Ershov, A.I.; Sandstrom, R.L.; Bykanov, A.N.; Vaschenko, G.O.; Böwering, N.R.; Das, P.; Fleurov, V.B.; Zhang, K.; Srivastava, S.N.; Ahmad, I.; Rajyaguru, C.; De Dea, S.; Dunstan, W.J.; Baumgart, P.; Ishihara, T.; Simmons, R.D.; Jacques, R.N.; Bergstedt, R.A.; Porshnev, P.I.; Wittak, C.J.; Woolston, M.R.; Rafac, R.J.; Grava, J.; Schafgans, A.A.; Tao, Y.
In: Proceedings of SPIE - The International Society for Optical Engineering , Extreme Ultraviolet (EUV) Lithography III. (Proceedings of SPIE - The International Society for Optical Engineering, 2012, 8322)
Conference
Brandt, D.C.; Fomenkov, I.V.; Ershov, A.I.; Partlo, W.N.; Myers, D.W.; Sandstrom, R.L.; La Fontaine, B.M.; Lercel, M.J.; Bykanov, A.N.; Böwering, N.R.; Vaschenko, G.O.; Khodykin, O.V.; Srivastava, S.N.; Ahmad, I.; Rajyaguru, C.; Das, P.; Fleurov, V.B.; Zhang, K.; Golich, D.J.; De Dea, S.; Hou, R.R.; Dunstan, W.J.; Wittak, C.J.; Baumgart, P.; Ishihara, T.; Simmons, R.D.; Jacques, R.N.; Bergstedt, R.A.
In: Proceedings of SPIE - The International Society for Optical Engineering , Extreme Ultraviolet (EUV) Lithography II. (Proceedings of SPIE - The International Society for Optical Engineering, 2011, 7969)
Conference
Fomenkov, I.V.; Ershov, A.I.; Partlo, W.N.; Myers, D.W.; Brown, D.; Sandstrom, R.L.; La Fontaine, B.; Bykanov, A.N.; Vaschenko, G.O.; Khodykin, O.V.; Böwering, N.R.; Das, P.; Fleurov, V.B.; Zhang, K.; Srivastava, S.N.; Ahmad, I.; Rajyaguru, C.; De Dea, S.; Hou, R.R.; Dunstan, W.J.; Baumgart, P.; Ishihara, T.; Simmons, R.D.; Jacques, R.N.; Bergstedt, R.A.; Brandt, D.C.
In: Proceedings of SPIE - The International Society for Optical Engineering , Extreme Ultraviolet (EUV) Lithography II. (Proceedings of SPIE - The International Society for Optical Engineering, 2011, 7969)
Conference
Brandt, D.C.; Fomenkov, I.V.; Ershov, A.I.; Partlo, W.N.; Myers, D.W.; Sandstrom, R.L.; Böwering, N.R.; Vaschenko, G.O.; Khodykin, O.V.; Bykanov, A.N.; Srivastava, S.N.; Ahmad, I.; Rajyaguru, C.; Golich, D.J.; De Dea, S.; Hou, R.R.; O'Brien, K.M.; Dunstan, W.J.
In: Proceedings of SPIE - The International Society for Optical Engineering , Extreme Ultraviolet (EUV) Lithography. (Proceedings of SPIE - The International Society for Optical Engineering, 2010, 7636)
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[AR] Vaschenko, G.O.
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