학술논문
'학술논문'
에서 검색결과 271건 | 목록
1~10
Academic Journal
Kim SE; Department of Family Science and Human Development, Montclair State University, Montclair, New Jersey, USA.; Hunt E; Department of Counseling Psychology, Teachers College, Columbia University, New York, New York, USA.; Tsai W; Department of Applied Psychology, New York University, New York, New York, USA.; Huang CY; Department of Counseling Psychology, Teachers College, Columbia University, New York, New York, USA.
Publisher: Family Process Country of Publication: United States NLM ID: 0400666 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1545-5300 (Electronic) Linking ISSN: 00147370 NLM ISO Abbreviation: Fam Process Subsets: MEDLINE
Academic Journal
Huang F; Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States.; Saini B; Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States.; Wan L; Western Digital, San Jose, California 94305, United States.; Lu H; Department of Physics and Astronomy, University of Nebraska-Lincoln, Lincoln, Nebraska 68588, United States.; He X; Electron Microscopy Core Facility and Department of Mechanical and Aerospace Engineering, University of Missouri, Columbia, Missouri 65211, United States.; Qin S; Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States.; Tsai W; Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States.; Gruverman A; Department of Physics and Astronomy, University of Nebraska-Lincoln, Lincoln, Nebraska 68588, United States.; Meng AC; Department of Physics and Astronomy, University of Missouri, Columbia, Missouri 65211, United States.; Wong HP; Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States.; McIntyre PC; Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States.; SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States.; Wong S; Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: PubMed not MEDLINE; MEDLINE
Academic Journal
Brajcich MR; Children's Hospital of Philadelphia, Philadelphia, PA, USA.; Bau GE; Rocky Mountain Poison & Drug Safety, Denver, CO, USA.; Tsai W; Denver Health Medical Center, Denver, CO, USA.; Birkholz M; Children's Hospital Colorado, Aurora, CO, USA.; Gaensbauer J; Mayo Clinic, Rochester, MN, USA.
Publisher: Sage Publications Country of Publication: United States NLM ID: 0372606 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1938-2707 (Electronic) Linking ISSN: 00099228 NLM ISO Abbreviation: Clin Pediatr (Phila) Subsets: MEDLINE
Academic Journal
Yoo C; Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States.; SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States.; Department of Materials Science and Engineering, Hongik University, Seoul 04066, Republic of Korea.; Hartanto J; Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States.; Saini B; Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States.; Tsai W; Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States.; Thampy V; SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States.; Niavol SS; Department of Physics and Astronomy, University of Missouri, Columbia, Missouri 65211, United States.; Meng AC; Department of Physics and Astronomy, University of Missouri, Columbia, Missouri 65211, United States.; McIntyre PC; Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States.; SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101088070 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1530-6992 (Electronic) Linking ISSN: 15306984 NLM ISO Abbreviation: Nano Lett Subsets: PubMed not MEDLINE; MEDLINE
Academic Journal
Yu SH; Department of Psychology, University of California, Los Angeles.; Saephan A; Department of Psychology, University of California, Los Angeles.; Weiss B; Department of Psychology and Human Development, Vanderbilt University.; Shih JH; Department of Psychology, Saint Joseph's University.; Tsai W; Department of Applied Psychology, New York University Steinhardt School of Culture, Education, and Human Development.; Kim JHJ; Department of Medicine, University of California, Irvine.; Lau AS; Department of Psychology, University of California, Los Angeles.
Publisher: Educational Pub. Foundation Country of Publication: United States NLM ID: 100956435 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1099-9809 (Print) Linking ISSN: 1077341X NLM ISO Abbreviation: Cultur Divers Ethnic Minor Psychol Subsets: MEDLINE
Academic Journal
Zax A; Clinical Child Psychology Program, University of Kansas, 1000 Sunnyside Ave., Lawrence, KS, 66045, USA. Alexandra.Zax@ku.edu.; Tsai W; Department of Applied Psychology, New York University, New York, NY, USA.; Lau AS; Department of Psychology, University of California, Los Angeles, CA, USA.; Weiss B; Department of Psychology & Human Development, Vanderbilt University, Nashville, TN, USA.; Gudiño OG; Clinical Child Psychology Program, University of Kansas, 1000 Sunnyside Ave., Lawrence, KS, 66045, USA.
Publisher: Kluwer Academic/Plenum Publishers Country of Publication: United States NLM ID: 1275332 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1573-3327 (Electronic) Linking ISSN: 0009398X NLM ISO Abbreviation: Child Psychiatry Hum Dev Subsets: MEDLINE
Academic Journal
Monte V; Applied Psychology, New York University, New York, New York, USA.; Ang JY; Applied Psychology, New York University, New York, New York, USA.; Tsai W; Applied Psychology, New York University, New York, New York, USA.
Publisher: Routledge Country of Publication: United States NLM ID: 8214119 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1940-3208 (Electronic) Linking ISSN: 07448481 NLM ISO Abbreviation: J Am Coll Health Subsets: MEDLINE
Academic Journal
Huang F; Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States.; Saini B; Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States.; Yu Z; Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States.; Yoo C; Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States.; SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States.; Thampy V; SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States.; He X; Electron Microscopy Core Facility and Department of Mechanical and Aerospace Engineering, University of Missouri, Columbia, Missouri 65211, United States.; Baniecki JD; SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States.; Tsai W; Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States.; Meng AC; Department of Physics and Astronomy, University of Missouri, Columbia, Missouri 65211, United States.; McIntyre PC; Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States.; SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States.; Wong S; Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: PubMed not MEDLINE; MEDLINE
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