부산대학교 도서관

Shrivastava, Megha; Kala, Abhinav; Dirin, Dmitry; Bodnarchuk, Maryna I; Gopal Achanta, Venu; Kovalenko, Maksym V; Adarsh, K. V.

2022 Conference on Lasers and Electro-Optics (CLEO) Lasers and Electro-Optics (CLEO), 2022 Conference on. :1-2 May, 2022

Georgakilas I; IBM Research Europe - Zurich, Säumerstrasse 4, 8803, Rüschlikon, Switzerland.; Institute of Quantum Electronics, Department of Physics, ETH Zürich, Auguste-Piccard-Hof 1, 8093, Zürich, Switzerland.; Tiede D; Multifunctional Optical Materials Group, Institute of Materials Science of Seville, Consejo Superior de Investigaciones Científicas - Universidad de Sevilla (CSIC-US), Américo Vespucio 49, Sevilla, 41092, Spain.; Urbonas D; IBM Research Europe - Zurich, Säumerstrasse 4, 8803, Rüschlikon, Switzerland.; Mirek R; IBM Research Europe - Zurich, Säumerstrasse 4, 8803, Rüschlikon, Switzerland.; Bujalance C; Multifunctional Optical Materials Group, Institute of Materials Science of Seville, Consejo Superior de Investigaciones Científicas - Universidad de Sevilla (CSIC-US), Américo Vespucio 49, Sevilla, 41092, Spain.; Caliò L; Multifunctional Optical Materials Group, Institute of Materials Science of Seville, Consejo Superior de Investigaciones Científicas - Universidad de Sevilla (CSIC-US), Américo Vespucio 49, Sevilla, 41092, Spain.; Oddi V; IBM Research Europe - Zurich, Säumerstrasse 4, 8803, Rüschlikon, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1-5/10, 8093, Zürich, Switzerland.; Tao R; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1-5/10, 8093, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Ueberlandstrasse 129, 8600, Dübendorf, Switzerland.; Dirin DN; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1-5/10, 8093, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Ueberlandstrasse 129, 8600, Dübendorf, Switzerland.; Rainò G; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1-5/10, 8093, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Ueberlandstrasse 129, 8600, Dübendorf, Switzerland.; Boehme SC; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1-5/10, 8093, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Ueberlandstrasse 129, 8600, Dübendorf, Switzerland.; Galisteo-López JF; Multifunctional Optical Materials Group, Institute of Materials Science of Seville, Consejo Superior de Investigaciones Científicas - Universidad de Sevilla (CSIC-US), Américo Vespucio 49, Sevilla, 41092, Spain.; Mahrt RF; IBM Research Europe - Zurich, Säumerstrasse 4, 8803, Rüschlikon, Switzerland.; Kovalenko MV; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1-5/10, 8093, Zürich, Switzerland. mvkovalenko@ethz.ch.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Ueberlandstrasse 129, 8600, Dübendorf, Switzerland. mvkovalenko@ethz.ch.; Miguez H; Multifunctional Optical Materials Group, Institute of Materials Science of Seville, Consejo Superior de Investigaciones Científicas - Universidad de Sevilla (CSIC-US), Américo Vespucio 49, Sevilla, 41092, Spain. h.miguez@csic.es.; Stöferle T; IBM Research Europe - Zurich, Säumerstrasse 4, 8803, Rüschlikon, Switzerland. tof@zurich.ibm.com.

Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101528555 Publication Model: Electronic Cited Medium: Internet ISSN: 2041-1723 (Electronic) Linking ISSN: 20411723 NLM ISO Abbreviation: Nat Commun Subsets: PubMed not MEDLINE; MEDLINE

Bhunia S; Institute of Chemistry, The Hebrew University of Jerusalem, Jerusalem91904, Israel.; Svyrydenko M; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, ZürichCH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Swiss Federal Laboratories for Materials Science and Technology (Empa), DübendorfCH-8600, Switzerland.; De A; Institute of Chemistry, The Hebrew University of Jerusalem, Jerusalem91904, Israel.; Kovalenko MV; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, ZürichCH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Swiss Federal Laboratories for Materials Science and Technology (Empa), DübendorfCH-8600, Switzerland.; Ruhman S; Institute of Chemistry, The Hebrew University of Jerusalem, Jerusalem91904, Israel.

Publisher: The Royal Society Country of Publication: England NLM ID: 101133385 Publication Model: Print Cited Medium: Internet ISSN: 1471-2962 (Electronic) Linking ISSN: 1364503X NLM ISO Abbreviation: Philos Trans A Math Phys Eng Sci Subsets: PubMed not MEDLINE; MEDLINE

Feld LG; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Boehme SC; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Sabisch S; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Frenkel N; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot, Israel.; Yazdani N; Department of Information Technology and Electrical Engineering, ETH Zürich, Zürich, Switzerland.; Morad V; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Zhu C; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Kim T; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Canossa S; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Svyrydenko M; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Tao R; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Bodnarchuk MI; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.; Lubin G; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot, Israel.; Kazes M; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot, Israel.; Wood V; Department of Information Technology and Electrical Engineering, ETH Zürich, Zürich, Switzerland.; Oron D; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot, Israel. dan.oron@weizmann.ac.il.; Rainò G; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland. rainog@ethz.ch.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland. rainog@ethz.ch.; Kovalenko MV; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, Switzerland. mvkovalenko@ethz.ch.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland. mvkovalenko@ethz.ch.

Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101528555 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 2041-1723 (Electronic) Linking ISSN: 20411723 NLM ISO Abbreviation: Nat Commun Subsets: MEDLINE

Vogel YB; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Empa- Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Tao R; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Empa- Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Chen H; Department of Chemical Engineering, Delft University of Technology, Van der Maasweg 9, 2629 HZ Delft, The Netherlands.; Ferraresi LJA; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Empa- Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Boehme SC; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Empa- Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Dirin DN; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Empa- Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Shorubalko I; Empa- Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Houtepen AJ; Department of Chemical Engineering, Delft University of Technology, Van der Maasweg 9, 2629 HZ Delft, The Netherlands.; Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Empa- Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 7503056 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1520-5126 (Electronic) Linking ISSN: 00027863 NLM ISO Abbreviation: J Am Chem Soc Subsets: MEDLINE

Dorey F; Photonics Laboratory, ETH Zürich, CH-8093 Zürich, Switzerland.; Ziegler JD; Photonics Laboratory, ETH Zürich, CH-8093 Zürich, Switzerland.; Moilanen AJ; Photonics Laboratory, ETH Zürich, CH-8093 Zürich, Switzerland.; Department of Physics and Mathematics, Faculty of Science, Forestry and Technology, University of Eastern Finland, Joensuu FI-80101, Finland.; Hordiichuk O; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, Institute of Inorganic Chemistry, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Nagamine G; Optical Materials Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zürich, CH-8092 Zürich, Switzerland.; Taniguchi T; International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba, Ibaraki 305-004, Japan.; Watanabe K; Research Center for Functional Materials, National Institute for Materials Science, Tsukuba, Ibaraki 305-004, Japan.; Norris DJ; Optical Materials Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zürich, CH-8092 Zürich, Switzerland.; Kovalenko MV; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, Institute of Inorganic Chemistry, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Rainò G; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, Institute of Inorganic Chemistry, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Novotny L; Photonics Laboratory, ETH Zürich, CH-8093 Zürich, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101088070 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1530-6992 (Electronic) Linking ISSN: 15306984 NLM ISO Abbreviation: Nano Lett Subsets: MEDLINE

Baumgärtner JF; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science & Technology, CH-8600 Dübendorf, Switzerland.; Šivavec J; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science & Technology, CH-8600 Dübendorf, Switzerland.; Klimpel M; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science & Technology, CH-8600 Dübendorf, Switzerland.; Kravchyk KV; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science & Technology, CH-8600 Dübendorf, Switzerland.; Kovalenko MV; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science & Technology, CH-8600 Dübendorf, Switzerland.; Institute of Energy Science and Technology (SIEST), Sungkyunkwan University (SKKU), 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 16419, Republic of Korea.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101697523 Publication Model: eCollection Cited Medium: Print ISSN: 2380-8195 (Print) NLM ISO Abbreviation: ACS Energy Lett Subsets: PubMed not MEDLINE

Sabisch S; ETH Zürich, Department of Chemistry and Applied Biosciences, Vladimir-Prelog-Weg 1-5, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Dressler OF; ETH Zürich, Department of Chemistry and Applied Biosciences, Vladimir-Prelog-Weg 1-5, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Ortikova O; ETH Zürich, Department of Chemistry and Applied Biosciences, Vladimir-Prelog-Weg 1-5, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Svyrydenko M; ETH Zürich, Department of Chemistry and Applied Biosciences, Vladimir-Prelog-Weg 1-5, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Elveren S; ETH Zürich, Department of Chemistry and Applied Biosciences, Vladimir-Prelog-Weg 1-5, Zürich CH-8093, Switzerland.; Feld LG; ETH Zürich, Department of Chemistry and Applied Biosciences, Vladimir-Prelog-Weg 1-5, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Dubenska L; ETH Zürich, Department of Chemistry and Applied Biosciences, Vladimir-Prelog-Weg 1-5, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Kovalenko MV; ETH Zürich, Department of Chemistry and Applied Biosciences, Vladimir-Prelog-Weg 1-5, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: PubMed not MEDLINE; MEDLINE

Kovalenko MV; President MatChem. mvkovalenko@ethz.ch.; Boehme SC; Vice-president MatChem. sboehme@ethz.ch.

Publisher: Swiss Chemical Society Country of Publication: Switzerland NLM ID: 0373152 Publication Model: Electronic Cited Medium: Print ISSN: 0009-4293 (Print) Linking ISSN: 00094293 NLM ISO Abbreviation: Chimia (Aarau) Subsets: PubMed not MEDLINE; MEDLINE

Dirin DN; Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir-Prelog-Weg 1, CH-8093 Zürich. ddirin@ethz.ch.; Empa - Swiss Federal Laboratories for Materials Science and Technology Laboratory for thin films and photovoltaics Ueberlandstrasse 129, CH-8600 Dübendorf.; Kovalenko MV; Department of Chemistry and Applied Biosciences, ETH Zurich, Vladimir-Prelog-Weg 1, CH-8093 Zürich. mvkovalenko@ethz.ch.; Empa - Swiss Federal Laboratories for Materials Science and Technology Laboratory for thin films and photovoltaics Ueberlandstrasse 129, CH-8600 Dübendorf.

Publisher: Swiss Chemical Society Country of Publication: Switzerland NLM ID: 0373152 Publication Model: Electronic Cited Medium: Print ISSN: 0009-4293 (Print) Linking ISSN: 00094293 NLM ISO Abbreviation: Chimia (Aarau) Subsets: PubMed not MEDLINE; MEDLINE

Haward TB; Department of Physics, Clarendon Laboratory, University of Oxford, Oxford OX1 3PU, U.K.; Lim VJ; Department of Physics, Clarendon Laboratory, University of Oxford, Oxford OX1 3PU, U.K.; Cherniukh I; Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, ETH Zürich, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Bodnarchuk MI; Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, ETH Zürich, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Kovalenko MV; Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, ETH Zürich, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Herz LM; Department of Physics, Clarendon Laboratory, University of Oxford, Oxford OX1 3PU, U.K.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: PubMed not MEDLINE; MEDLINE

Sakhatskyi K; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, CH-8600, Switzerland.; Bartosh V; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, CH-8600, Switzerland.; Zhou Y; Department of Applied Physical Sciences, University of North Carolina at Chapel Hill, Chapel Hill, NC, 27599, USA.; Matt GJ; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, CH-8600, Switzerland.; Zhao J; School of Physical Science and Technology, Chongqing Key Lab of Micro&Nano Structure Optoelectronics, Southwest University, Chongqing, 400715, China.; Yakunin S; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, CH-8600, Switzerland.; Huang J; Department of Applied Physical Sciences, University of North Carolina at Chapel Hill, Chapel Hill, NC, 27599, USA.; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, NC, 27599, USA.; Kovalenko MV; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich, CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, CH-8600, Switzerland.; Institute of Energy Science and Technology (SIEST), Sungkyunkwan University (SKKU), 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do, 16419, Republic of Korea.

Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 9885358 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1521-4095 (Electronic) Linking ISSN: 09359648 NLM ISO Abbreviation: Adv Mater Subsets: MEDLINE

Anzini P; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; CLIP-Como Lake Institute of Photonics, via Valleggio 11, Como, 22100, Italy.; Bossuto MC; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; Colombo M; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; Vivani A; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; Cherniukh I; Department of Chemistry and Applied Bioscience, Institute of Inorganic Chemistry, ETH Zurich, Vladimir Prelog Weg 1, Zurich, CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials, Science and Technology, Dubendorf, CH-8600, Switzerland.; Bodnarchuk MI; Department of Chemistry and Applied Bioscience, Institute of Inorganic Chemistry, ETH Zurich, Vladimir Prelog Weg 1, Zurich, CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials, Science and Technology, Dubendorf, CH-8600, Switzerland.; Kovalenko MV; Department of Chemistry and Applied Bioscience, Institute of Inorganic Chemistry, ETH Zurich, Vladimir Prelog Weg 1, Zurich, CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials, Science and Technology, Dubendorf, CH-8600, Switzerland.; Bertolotti F; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; Guagliardi A; Istituto di Cristallografia (IC) and To.Sca.Lab, Consiglio Nazionale delle Ricerche (CNR), via Valleggio 11, Como, I-22100, Italy.; Masciocchi N; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; Ferri F; Dipartimento di Scienza e Alta Tecnologia and To.Sca.Lab, Universita degli Studi dell'Insubria, Via Valleggio 11, Como, I-22100, Italy.; CLIP-Como Lake Institute of Photonics, via Valleggio 11, Como, 22100, Italy.

Publisher: WILEY-VCH Verlag GmbH & Co. KGaA Country of Publication: Germany NLM ID: 101724536 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 2366-9608 (Electronic) Linking ISSN: 23669608 NLM ISO Abbreviation: Small Methods Subsets: PubMed not MEDLINE; MEDLINE

Baumgärtner JF; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Isler D; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Nguyen HQ; Department of Material Science and Engineering, NTNU Norwegian University of Science and Technology, 7034 Trondheim, Norway.; Klimpel M; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Šivavec J; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Černe C; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Chernyshov D; Swiss-Norwegian Beam Lines at the European Synchrotron Radiation Facility, 38000 Grenoble, France.; van Beek W; Swiss-Norwegian Beam Lines at the European Synchrotron Radiation Facility, 38000 Grenoble, France.; Rettenwander D; Department of Material Science and Engineering, NTNU Norwegian University of Science and Technology, 7034 Trondheim, Norway.; Christian Doppler Laboratory for Solid-State Batteries, NTNU Norwegian University of Science and Technology, 7034 Trondheim, Norway.; Austrian Institute of Technology GmbH, Center for Transport Technologies, Battery Technologies, Vienna 1210, Austria.; Kravchyk KV; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Kovalenko MV; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101697523 Publication Model: eCollection Cited Medium: Print ISSN: 2380-8195 (Print) NLM ISO Abbreviation: ACS Energy Lett Subsets: PubMed not MEDLINE

Berezovska Y; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Sabisch S; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Bernasconi C; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Sahin Y; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Bertolotti F; Dipartimento di Scienza e Alta Tecnologia & To.Sca.Lab, Università dell'Insubria, 22100 Como, Italy.; Guagliardi A; Istituto di Cristallografia & To.Sca.Lab, Consiglio Nazionale delle Ricerche, 22100 Como, Italy.; Bodnarchuk MI; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Dirin DN; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 7503056 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1520-5126 (Electronic) Linking ISSN: 00027863 NLM ISO Abbreviation: J Am Chem Soc Subsets: PubMed not MEDLINE; MEDLINE

Ibáñez M; Institute of Science and Technology Austria (ISTA), Am Campus 1, 3400 Klosterneuburg, Austria.; Boehme SC; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory of Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Buonsanti R; Laboratory of Nanochemistry for Energy (LNCE), Department of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne, CH-1950 Sion, Switzerland.; De Roo J; Department of Chemistry, University of Basel, 4058 Basel, Switzerland.; Milliron DJ; McKetta Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78712, United States.; Department of Chemistry, University of Texas at Austin, Austin, Texas 78712, United States.; Ithurria S; Laboratoire de Physique et d'Etude des Matériaux, ESPCI-Paris, PSL Research University, Sorbonne Université Univ Paris 06, CNRS UMR 8213, 10 rue Vauquelin, 75005 Paris, France.; Rogach AL; Department of Materials Science and Engineering, and Centre for Functional Photonics (CFP), City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong, SAR 999077, P. R. China.; Cabot A; Catalonia Institute for Energy Research - IREC, Sant Adrià de Besòs, Barcelona 08930, Spain.; ICREA, Pg. Lluís Companys 23, 08010 Barcelona, Spain.; Yarema M; Chemistry and Materials Desing Group, Institute for Electronics, Department of Information Technology and Electrical Engineering, ETH Zurich, Gloriastrasse 35, CH-8092 Zurich, Switzerland.; Cossairt BM; University of Washington, Box 351700, Seattle, Washington 98195-1700, United States.; Reiss P; Univ. Grenoble Alpes, CEA, CNRS, IRIG-SyMMES, STEP, 38000 Grenoble, France.; Talapin DV; Department of Chemistry, James Franck Institute, and Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States.; Protesescu L; Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 3, Groningen 9747AG, The Netherlands.; Hens Z; Physics and Chemistry of Nanostructures, Department of Chemistry, Ghent University, B-9000 Gent, Belgium.; Center for Nano- and Biophotonics, Ghent University, B-9052 Gent, Belgium.; Infante I; BCMaterials, Basque Center for Materials, Applications, and Nanostructures, UPV/EHU Science Park, Leioa 48940, Spain.; Ikerbasque Basque Foundation for Science, Plaza Euskadi 5, Bilbao 48009, Spain.; Bodnarchuk MI; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory of Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Ye X; Department of Chemistry, Indiana University, Bloomington, Indiana 47405, United States.; Wang Y; State Key Laboratory of Coordination Chemistry, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210023, China.; Zhang H; Department of Chemistry, Center for BioAnalytical Chemistry, Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Tsinghua University, Beijing 100084, China.; Lhuillier E; Sorbonne Université, CNRS, Institut des NanoSciences de Paris, 4 Place Jussieu, 75005 Paris, France.; Klimov VI; Nanotechnology and Advanced Spectroscopy Team, C-PCS, Chemistry Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, United States.; Utzat H; Department of Materials Science and Engineering, Stanford University, 496 Lomita Mall, Palo Alto, California 94305, United States.; Rainò G; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory of Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Kagan CR; Electrical and Systems Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States.; Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States.; Department of Materials Science and Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States.; Cargnello M; Department of Chemical Engineering and SUNCAT Center for Interface Science and Catalysis, Stanford University, Stanford, California 94305, United States.; Son JS; Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Gyeongsangbuk-do 37673, Republic of Korea.; Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory of Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; SKKU Institute of Energy Science and Technology (SIEST), Sungkyunkwan University (SKKU), 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 16419, Republic of Korea.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: PubMed not MEDLINE; MEDLINE

Zhu C; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Feld LG; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Boehme SC; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Cherniukh I; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Bodnarchuk MI; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.; Rainò G; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101088070 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1530-6992 (Electronic) Linking ISSN: 15306984 NLM ISO Abbreviation: Nano Lett Subsets: PubMed not MEDLINE; MEDLINE

Kominko Y; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Sabisch S; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Kanak A; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Dubenska L; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Cherniukh I; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Klimpel M; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Liu X; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Tsarev S; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Boehme SC; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Matt GJ; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Rainò G; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Kovalenko MV; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Yakunin S; ETH Zürich, Department of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Vladimir-Prelog-Weg 1, Zürich CH-8093, Switzerland.; Empa-Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: PubMed not MEDLINE; MEDLINE

Kolomiiets O; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.; Stelmakh A; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.; Rajan A; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.; Sabisch S; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.; Rainò G; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.; Baumketner A; Institute for Condensed Matter Physics, National Academy of Sciences of Ukraine, 1 Svientsitsky Str, Lviv 79011, Ukraine.; Kovalenko MV; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.; SKKU Institute of Energy Science and Technology (SIEST), Sungkyunkwan University (SKKU), 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 16419, Republic of Korea.; Bodnarchuk MI; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf CH-8600, Switzerland.; Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, Zürich CH-8093, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: PubMed not MEDLINE; MEDLINE

Ghosh A; Department of Chemistry, McGill University, Montreal H3A 0B8, Canada.; Palato S; Department of Chemistry, Humbolt University, Berlin 12489, Germany.; Brosseau P; Department of Chemistry, McGill University, Montreal H3A 0B8, Canada.; Tao R; Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf CH-8600, Switzerland.; Dirin DN; Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf CH-8600, Switzerland.; Kovalenko MV; Department of Chemistry and Applied Biosciences, ETH Zürich, Zürich CH-8093, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf CH-8600, Switzerland.; Kambhampati P; Department of Chemistry, McGill University, Montreal H3A 0B8, Canada.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: PubMed not MEDLINE; MEDLINE