학술논문
전자자료 공정이용 안내
우리 대학 도서관에서 구독·제공하는 모든 전자자료(데이터베이스, 전자저널, 전자책 등)는 국내외 저작권법과 출판사와의 라이선스 계약에 따라 엄격하게 보호를 받고 있습니다.
전자자료의 비정상적 이용은 출판사로부터의 경고, 서비스 차단, 손해배상 청구 등 학교 전체에 심각한 불이익을 초래할 수 있으므로, 아래의 공정이용 지침을 반드시 준수해 주시기 바랍니다.
공정이용 지침
- 전자자료는 개인의 학습·교육·연구 목적의 비영리적 사용에 한하여 이용할 수 있습니다.
- 합리적인 수준의 다운로드 및 출력만 허용됩니다. (일반적으로 동일 PC에서 동일 출판사의 논문을 1일 30건 이하 다운로드할 것을 권장하며, 출판사별 기준에 따라 다를 수 있습니다.)
- 출판사에서 제공한 논문의 URL을 수업 관련 웹사이트에 게재할 수 있으나, 출판사 원문 파일 자체를 복제·배포해서는 안 됩니다.
- 본인의 ID/PW를 타인에게 제공하지 말고, 도용되지 않도록 철저히 관리해 주시기 바랍니다.
불공정 이용 사례
- 전자적·기계적 수단(다운로딩 프로그램, 웹 크롤러, 로봇, 매크로, RPA 등)을 이용한 대량 다운로드
- 동일 컴퓨터 또는 동일 IP에서 단시간 내 다수의 원문을 집중적으로 다운로드하거나, 전권(whole issue) 다운로드
- 저장·출력한 자료를 타인에게 배포하거나 개인 블로그·웹하드 등에 업로드
- 상업적·영리적 목적으로 자료를 전송·복제·활용
- ID/PW를 타인에게 양도하거나 타인 계정을 도용하여 이용
- EndNote, Mendeley 등 서지관리 프로그램의 Find Full Text 기능을 이용한 대량 다운로드
- 출판사 콘텐츠를 생성형 AI 시스템에서 활용하는 행위(업로드, 개발, 학습, 프로그래밍, 개선 또는 강화 등)
위반 시 제재
- 출판사에 의한 해당 IP 또는 기관 전체 접속 차단
- 출판사 배상 요구 시 위반자 개인이 배상 책임 부담
'학술논문'
에서 검색결과 15건 | 목록
1~20
Academic Journal
Islam MR; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA.; Karna P; Department of Mechanical Industrial and Systems Engineering, University of Rhode Island, Kingston, RI, 02881, USA.; Tomko JA; Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, 22904, USA.; Hoglund ER; Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, 22904, USA.; Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37830, USA.; Hirt DM; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA.; Hoque MSB; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA.; Zare S; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA.; Aryana K; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA.; Pfeifer TW; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA.; Jezewski C; Components Research, Intel Corporation, Hillsboro, Oregon, OR, 97124, USA.; Giri A; Department of Mechanical Industrial and Systems Engineering, University of Rhode Island, Kingston, RI, 02881, USA.; Landon CD; Logic Technology Development, Intel Corporation, Hillsboro, Oregon, OR, 97124, USA.; King SW; Supplier, Technology, and Industry Development, Intel Corporation, Hillsboro, Oregon, OR, 97124, USA.; Hopkins PE; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA. phopkins@virginia.edu.; Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, 22904, USA. phopkins@virginia.edu.; Department of Physics, University of Virginia, Charlottesville, VA, 22904, USA. phopkins@virginia.edu.
Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101528555 Publication Model: Electronic Cited Medium: Internet ISSN: 2041-1723 (Electronic) Linking ISSN: 20411723 NLM ISO Abbreviation: Nat Commun Subsets: MEDLINE; PubMed not MEDLINE
Academic Journal
The Journal of Chemical Thermodynamics. 128:320-335
Academic Journal
Vemuri V; Department of Materials Science and Engineering, Lehigh University, Bethlehem, Pennsylvania 18015, United States.; King SW; Logic Technology Development, Intel Corporation, Hillsboro, Oregon 97124, United States.; Thorpe R; Institute for Functional Materials and Devices, Lehigh University, Bethlehem, Pennsylvania 18015-3027, United States.; Jones AH; Laser Thermal Analysis, Inc., Charlottesville, Virginia 22902, United States.; Gaskins JT; Laser Thermal Analysis, Inc., Charlottesville, Virginia 22902, United States.; Hopkins PE; Department of Materials Science and Engineering, University of Virginia, Charlottesville, Virginia 22904, United States.; Department of Physics, University of Virginia, Charlottesville, Virginia 22904, United States.; Strandwitz NC; Department of Materials Science and Engineering, Lehigh University, Bethlehem, Pennsylvania 18015, United States.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101734996 Publication Model: eCollection Cited Medium: Internet ISSN: 2637-6113 (Electronic) Linking ISSN: 26376113 NLM ISO Abbreviation: ACS Appl Electron Mater Subsets: PubMed not MEDLINE
Academic Journal
Stan G; Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland20899, United States.; Ciobanu CV; Department of Mechanical Engineering and Materials Science Program, Colorado School of Mines, Golden, Colorado80401, United States.; King SW; Supplier Technology and Industry Development, Intel Corporation, Hillsboro, Oregon97124, United States.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: MEDLINE; PubMed not MEDLINE
Academic Journal
Scott EA; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, Virginia 22904, United States.; King SW; Logic Technology Development, Intel Corporation, Hillsboro, Oregon 97124, United States.; Jarenwattananon NN; Center for Materials Characterization in Oregon, University of Oregon, Eugene, Oregon 97403, United States.; Lanford WA; Physics Department, University at Albany, SUNY, Albany, New York 12222, United States.; Li H; CQN Labs, Intel Corporation, Hillsboro, Oregon 97124, United States.; Rhodes J; Logic Technology Development, Intel Corporation, Hillsboro, Oregon 97124, United States.; Hopkins PE; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, Virginia 22904, United States.; Department of Materials Science and Engineering, University of Virginia, Charlottesville, Virginia 22904, United States.; Department of Physics, University of Virginia, Charlottesville, Virginia 22904, United States.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101088070 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1530-6992 (Electronic) Linking ISSN: 15306984 NLM ISO Abbreviation: Nano Lett Subsets: MEDLINE; PubMed not MEDLINE
Academic Journal
Matsuda Y; Stanford University, Stanford, CA, 94305, USA.; Ryu I; King SW; Bielefeld J; Dauskardt RH
Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 101235338 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1613-6829 (Electronic) Linking ISSN: 16136810 NLM ISO Abbreviation: Small Subsets: PubMed not MEDLINE
Academic Journal
Giri A; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA.; King SW; Intel Corporation, Logic Technology Development, 5200 NE Elam Young Parkway, Hillsboro, OR, 97124, USA.; Lanford WA; Department of Physics, University at Albany, State University of New York, Albany, NY, 12222, USA.; Mei AB; Intel Corporation, Logic Technology Development, 5200 NE Elam Young Parkway, Hillsboro, OR, 97124, USA.; Merrill D; Intel Corporation, Logic Technology Development, 5200 NE Elam Young Parkway, Hillsboro, OR, 97124, USA.; Li L; Intel Corporation, Logic Technology Development, 5200 NE Elam Young Parkway, Hillsboro, OR, 97124, USA.; Oviedo R; Intel Corporation, Logic Technology Development, 5200 NE Elam Young Parkway, Hillsboro, OR, 97124, USA.; Richards J; Intel Corporation, Logic Technology Development, 5200 NE Elam Young Parkway, Hillsboro, OR, 97124, USA.; Olson DH; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA.; Braun JL; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA.; Gaskins JT; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA.; Deangelis F; The George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA, 30332, USA.; Henry A; The George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA, 30332, USA.; Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, 02139, Massachusetts, USA.; Hopkins PE; Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA.
Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 9885358 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1521-4095 (Electronic) Linking ISSN: 09359648 NLM ISO Abbreviation: Adv Mater Subsets: PubMed not MEDLINE
Academic Journal
Stan G; Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA.; Mays E; Logic Technology Development, Intel Corporation, Hillsboro, OR 97124, USA.; Yoo HJ; Components Research, Intel Corporation, Hillsboro, OR 97124, USA.; King SW; Logic Technology Development, Intel Corporation, Hillsboro, OR 97124, USA.
Publisher: Society for Experimental Stress Analysis Country of Publication: United States NLM ID: 101469718 Publication Model: Print Cited Medium: Print ISSN: 0014-4851 (Print) Linking ISSN: 00144851 NLM ISO Abbreviation: Exp Mech Subsets: PubMed not MEDLINE
Academic Journal
Stan G; Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.; Gates RS; Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.; Hu Q; Anasys Instruments Incorporated, Santa Barbara, CA 93101, USA.; Kjoller K; Anasys Instruments Incorporated, Santa Barbara, CA 93101, USA.; Prater C; Anasys Instruments Incorporated, Santa Barbara, CA 93101, USA.; Jit Singh K; Components Research, Intel Corporation, Hillsboro OR 97124, USA.; Mays E; Logic Technology Development, Intel Corporation, 5200 NE Elam Young Parkway, Hillsboro OR 97124, USA.; King SW; Logic Technology Development, Intel Corporation, 5200 NE Elam Young Parkway, Hillsboro OR 97124, USA.
Publisher: Beilstein-Institut zur Förderung der Chemischen Wissenschaften Country of Publication: Germany NLM ID: 101551563 Publication Model: eCollection Cited Medium: Print ISSN: 2190-4286 (Print) Linking ISSN: 21904286 NLM ISO Abbreviation: Beilstein J Nanotechnol Subsets: PubMed not MEDLINE
Academic Journal
Hernandez-Charpak JN; JILA and Department of Physics, University of Colorado , Boulder, Colorado 80309-0440, United States.; Hoogeboom-Pot KM; JILA and Department of Physics, University of Colorado , Boulder, Colorado 80309-0440, United States.; Intel Corp., 2501 NW 229th Avenue, Hillsboro, Oregon 97124, United States.; Li Q; JILA and Department of Physics, University of Colorado , Boulder, Colorado 80309-0440, United States.; Frazer TD; JILA and Department of Physics, University of Colorado , Boulder, Colorado 80309-0440, United States.; Knobloch JL; JILA and Department of Physics, University of Colorado , Boulder, Colorado 80309-0440, United States.; Tripp M; Intel Corp., 2501 NW 229th Avenue, Hillsboro, Oregon 97124, United States.; King SW; Intel Corp., 2501 NW 229th Avenue, Hillsboro, Oregon 97124, United States.; Anderson EH; Center for X-ray Optics, Lawrence Berkeley National Laboratory , Berkeley, California 94720, United States.; Chao W; Center for X-ray Optics, Lawrence Berkeley National Laboratory , Berkeley, California 94720, United States.; Murnane MM; JILA and Department of Physics, University of Colorado , Boulder, Colorado 80309-0440, United States.; Kapteyn HC; JILA and Department of Physics, University of Colorado , Boulder, Colorado 80309-0440, United States.; Nardi D; JILA and Department of Physics, University of Colorado , Boulder, Colorado 80309-0440, United States.; Intel Corp., 2501 NW 229th Avenue, Hillsboro, Oregon 97124, United States.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101088070 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1530-6992 (Electronic) Linking ISSN: 15306984 NLM ISO Abbreviation: Nano Lett Subsets: PubMed not MEDLINE
Academic Journal
Stan G; Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA. School of Engineering and Applied Science, George Washington University, Washington, DC 20052, USA.; Mays E; Yoo HJ; King SW
Publisher: IOP Pub Country of Publication: England NLM ID: 101241272 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1361-6528 (Electronic) Linking ISSN: 09574484 NLM ISO Abbreviation: Nanotechnology Subsets: PubMed not MEDLINE
Academic Journal
Stan G; †Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States.; ‡Department of Mechanical Engineering, University of Maryland, College Park, Maryland 20742, United States.; Ciobanu CV; §Department of Mechanical Engineering, Colorado School of Mines, Golden, Colorado 80401, United States.; Levin I; †Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States.; Yoo HJ; ∥Components Research, Intel Corporation, Hillsboro, Oregon 97124, United States.; Myers A; ∥Components Research, Intel Corporation, Hillsboro, Oregon 97124, United States.; Singh K; ∥Components Research, Intel Corporation, Hillsboro, Oregon 97124, United States.; Jezewski C; ∥Components Research, Intel Corporation, Hillsboro, Oregon 97124, United States.; Miner B; ⊥Logic Technology Development, Intel Corporation, Hillsboro, Oregon 97124, United States.; King SW; ⊥Logic Technology Development, Intel Corporation, Hillsboro, Oregon 97124, United States.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101088070 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1530-6992 (Electronic) Linking ISSN: 15306984 NLM ISO Abbreviation: Nano Lett Subsets: PubMed not MEDLINE
Academic Journal
Matsuda Y; Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA.; Kim N; King SW; Bielefeld J; Stebbins JF; Dauskardt RH
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: MEDLINE
Academic Journal
Milosevic M; MeV Technologies, Westport, Connecticut 06880, USA. milan@mevtechnologies.com; King SW
Publisher: Optica Publishing Group Country of Publication: United States NLM ID: 0247660 Publication Model: Print Cited Medium: Internet ISSN: 1539-4522 (Electronic) Linking ISSN: 1559128X NLM ISO Abbreviation: Appl Opt Subsets: PubMed not MEDLINE
Academic Journal
Stan G; Nanomechanical Properties Group, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA. gheorghe.stan@nist.gov; King SW; Cook RF
Publisher: IOP Pub Country of Publication: England NLM ID: 101241272 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1361-6528 (Electronic) Linking ISSN: 09574484 NLM ISO Abbreviation: Nanotechnology Subsets: MEDLINE
검색 결과 제한하기
제한된 항목
[AR] King, Sean W
발행연도 제한
-
학술DB(Database Provider)
저널명(출판물, Title)
출판사(Publisher)
자료유형(Source Type)
주제어
언어