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발행년	- (예 : 2010-2015)

Critical issues in the integration of copper and low-k dielectrics

Conference

Donaton, R.A.; Coenagrachts, B.; Maex, K.; Struyf, H.; Vanhaelemeersch, S.; Beyer, G.; Richard, E.; Vervoort, I.; Fyen, W.; Grillaert, J.; Van der Groen, S.; Stucchi, M.; De Roest, D.

Proceedings of the IEEE 1999 International Interconnect Technology Conference (Cat. No.99EX247) Interconnect technology Interconnect Technology, 1999. IEEE International Conference. :262-264 1999

Full Text (IEEE) Find it@PNU

Modelling the influence of pad bending on the planarization performance during CMP

Conference

Grillaert, J.; Meuris, M.; Vrancken, E.; Heylen, N.; Devriendt, K.; Fyen, W.; Heyns, M.

In: Materials Research Society Symposium - Proceedings. (Materials Research Society Symposium - Proceedings, 1999, 566:45-50)

Scopus Find it@PNU

Characterization of slurry system and suppression of oxide erosion in aluminum CMP (Chemical-Mechanical Planarization)

Conference

Zhong, L.; Yang, J.; Holland, K.; Grillaert, J.; Devriend, K.; Heylen, N.; Meuris, M.

In: Materials Research Society Symposium - Proceedings. (Materials Research Society Symposium - Proceedings, 1999, 566:115-120)

Scopus Find it@PNU

New dummy-free shallow trench isolation concept for mixed-signal applications

Academic Journal

Badenes, G.; Rooyackers, R.; Augendre, E.; Vandamme, E.; Perelló, C.; Heylen, N.; Grillaert, J.; Deferm, L.

In: Journal of the Electrochemical Society. (Journal of the Electrochemical Society, October 2000, 147(10):3827-3832)

Web of Science JCR 저널정보 Scopus Find it@PNU

A new dummy-free shallow trench isolation concept for mixed-signal applications

Academic Journal

Badenes, G.; Rooyackers, R.; Augendre, E.; Vandamme, E.; Perello, C.; Heylen, N.; Grillaert, J.; Deferm, L.

In: Journal of the Electrochemical Society. (Journal of the Electrochemical Society, 2000, 147(10):3820-3826)

Web of Science JCR 저널정보 Scopus Find it@PNU

A static model for scratches generated during aluminum chemical-mechanical polishing process: Orbital technology

Academic Journal

Zhong, L.; Yang, J.; Holland, K.; Grillaert, J.; Devriend, K.; Heylen, N.; Meuris, M.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. (Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38(4 A):1932-1938)

Full Text (IOP) Web of Science JCR 저널정보 Scopus Find it@PNU

Relation between Oxide-CMP Induced Defects and Post-CMP Cleaning Strategies

Periodical

Devriendt, K.; Vrancken, Evi; Heylen, N.; Grillaert, J.; Meuris, Marc; Heyns, Marc M.; Lin, Z.C.

Diffusion and Defect Data Part B: Solid State Phenomena; November 1998, Vol. 65 Issue: 1 p173-176, 4p

Scopus Find it@PNU

Relation between oxide-CMP induced defects and post-CMP cleaning strategies

Book

Devriendt, K.; Vrancken, E.; Heylen, N.; Grillaert, J.; Meuris, M.; Heyns, M.M.; Lin, Z.

In: Ultra Clean Processing of Silicon Surfaces. (Solid State Phenomena, 1999, 65-66:173-176)

Scopus Find it@PNU

A new scaling issue in the electrical behaviour of damascene vs. plasma-etched interconnects

Electronic Resource

UCL; Proost, Joris; Conard, T.; Boullart, W.; Grillaert, J.; Maex, K.; Mater. Res. Soc. Conference on Advanced Metallization and Interconnect Systems for ULSI Applications

Open Access (OAIster)

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